Logic chip including embedded magnetic tunnel junctions
First Claim
1. An apparatus comprising:
- a monolithic substrate;
a memory area, comprising (a) a magnetic tunnel junction (MTJ) that includes a tunnel barrier directly contacting lower and upper MTJ layers, located on the substrate; and
(b) an additional MTJ, having an additional tunnel barrier directly contacting additional lower and upper MTJ layers; and
a logic area located on the substrate;
wherein a horizontal plane, which is parallel to the tunnel barrier, intersects the MTJ and the additional MTJ, a first Inter-Layer Dielectric (ILD) material included in the memory area, and a second ILD material included in the logic area;
wherein the upper MTJ layer includes an upper MTJ layer sidewall and the lower MTJ layer includes a lower MTJ sidewall horizontally offset from the upper MTJ layer sidewall by a horizontal offset space that defines a horizontal offset distance;
wherein a contiguous etch stop portion directly contacts the MTJ and the additional MTJ.
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Accused Products
Abstract
An embodiment integrates memory, such as spin-torque transfer magnetoresistive random access memory (STT-MRAM) within a logic chip. The STT-MRAM includes a magnetic tunnel junction (MTJ) with an upper MTJ layer, lower MTJ layer, and tunnel barrier directly contacting the upper MTJ layer and the lower MTJ layer; wherein the upper MTJ layer includes an upper MTJ layer sidewall and the lower MTJ layer includes a lower MTJ sidewall horizontally offset from the upper MTJ layer. Another embodiment includes a memory area, comprising a MTJ, and a logic area located on a substrate; wherein a horizontal plane intersects the MTJ, a first Inter-Layer Dielectric (ILD) material adjacent the MTJ, and a second ILD material included in the logic area, the first and second ILD materials being unequal to one another. In an embodiment the first and second ILDs directly contact one another. Other embodiments are described herein.
41 Citations
24 Claims
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1. An apparatus comprising:
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a monolithic substrate; a memory area, comprising (a) a magnetic tunnel junction (MTJ) that includes a tunnel barrier directly contacting lower and upper MTJ layers, located on the substrate; and
(b) an additional MTJ, having an additional tunnel barrier directly contacting additional lower and upper MTJ layers; anda logic area located on the substrate; wherein a horizontal plane, which is parallel to the tunnel barrier, intersects the MTJ and the additional MTJ, a first Inter-Layer Dielectric (ILD) material included in the memory area, and a second ILD material included in the logic area; wherein the upper MTJ layer includes an upper MTJ layer sidewall and the lower MTJ layer includes a lower MTJ sidewall horizontally offset from the upper MTJ layer sidewall by a horizontal offset space that defines a horizontal offset distance; wherein a contiguous etch stop portion directly contacts the MTJ and the additional MTJ. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An apparatus comprising:
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a monolithic substrate; a memory area, comprising a magnetic tunnel junction (MTJ) that includes a tunnel barrier directly contacting lower and upper MTJ layers, located on the substrate; and a logic area located on the substrate; wherein a horizontal plane, which is parallel to the tunnel barrier, intersects the MTJ, a first Inter-Layer Dielectric (ILD) material included in the memory area, and a second ILD material included in the logic area and unequal to the first ILD material; wherein the horizontal plane intersects etch stop material included between the MTJ and the first ILD material. - View Dependent Claims (12, 13, 14)
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15. An apparatus comprising:
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a first magnetic tunnel junction (MTJ) including a first upper MTJ layer, a first lower MTJ layer, and a first tunnel barrier directly contacting a first lower surface of the first upper MTJ layer and a first upper surface of the first lower MTJ layer; a memory area, including the first MTJ, and a logic area on a monolithic substrate; wherein the first upper MTJ layer includes a first upper MTJ layer sidewall and the first lower MTJ layer includes a first lower MTJ sidewall horizontally offset from the first upper MTJ layer sidewall by a first horizontal offset space that defines a first horizontal offset distance; wherein a first spacer, having a width equal to the first horizontal offset distance, directly contacts the first upper MTJ layer and the first tunnel barrier; wherein a first horizontal plane, parallel to the first lower surface of the first upper MTJ layer, intersects the first MTJ, a first ILD material adjacent the first MTJ, and a second ILD material included in the logic area, the first and second ILD materials being unequal to one another; wherein the first horizontal plane intersects a first polish stop material included between the first MTJ and the first ILD material. - View Dependent Claims (16, 17)
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18. An apparatus comprising:
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a monolithic substrate; a memory area, comprising a magnetic tunnel junction (MTJ) that includes a tunnel barrier directly contacting lower and upper MTJ layers, located on the substrate; a logic area located on the substrate; a spacer, having a width equal to a horizontal offset distance, directly contacting the upper MTJ layer and the tunnel barrier; and a hardmask directly contacting an upper surface of the upper MTJ layer and the spacer; wherein a horizontal plane, which is parallel to the tunnel barrier, intersects the MTJ, a first Inter-Layer Dielectric (ILD) material included in the memory area, and a second ILD material included in the logic area; wherein the upper MTJ layer includes an upper MTJ layer sidewall and the lower MTJ layer includes a lower MTJ sidewall horizontally offset from the upper MTJ layer sidewall by a horizontal offset space that defines the horizontal offset distance. - View Dependent Claims (19, 20, 21, 22, 23, 24)
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Specification