Inductor structure with magnetic material
First Claim
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1. An inductor structure, comprising:
- a substrate;
a first dielectric layer formed over the substrate;
a first metal layer formed in the first dielectric layer;
a second dielectric layer over the first metal layer;
a magnetic layer formed over the first dielectric layer, wherein the magnetic layer has a top surface, a bottom surface and sidewall surfaces between the top surface and the bottom surface, and the sidewall surfaces have at least two intersection points, and wherein the sidewall surfaces comprise a first pair of sidewall surfaces adjoin the bottom surface and a second pair of sidewall surfaces adjoin the first pair of sidewall surfaces, whereinthe first pair of sidewall surfaces are vertical to the bottom surface of the magnetic layer; and
the second pair of sidewall surfaces taper gradually toward the top surface of the magnetic layer.
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Abstract
Embodiments of mechanisms of forming an inductor structure are provided. The inductor structure includes a substrate and a first dielectric layer formed over the substrate. The inductor structure includes a first metal layer formed in the first dielectric layer and a second dielectric layer over the first metal layer. The inductor structure further includes a magnetic layer formed over the first dielectric layer, and the magnetic layer has a top surface, a bottom surface and sidewall surfaces between the top surface and the bottom surface, and the sidewall surfaces have at least two intersection points.
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Citations
20 Claims
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1. An inductor structure, comprising:
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a substrate; a first dielectric layer formed over the substrate; a first metal layer formed in the first dielectric layer; a second dielectric layer over the first metal layer; a magnetic layer formed over the first dielectric layer, wherein the magnetic layer has a top surface, a bottom surface and sidewall surfaces between the top surface and the bottom surface, and the sidewall surfaces have at least two intersection points, and wherein the sidewall surfaces comprise a first pair of sidewall surfaces adjoin the bottom surface and a second pair of sidewall surfaces adjoin the first pair of sidewall surfaces, wherein the first pair of sidewall surfaces are vertical to the bottom surface of the magnetic layer; and the second pair of sidewall surfaces taper gradually toward the top surface of the magnetic layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 16, 17, 18, 19, 20)
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12. An inductor structure, comprising:
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a substrate; a first metal layer formed in a first dielectric layer; a magnetic layer formed on the first dielectric layer, wherein the magnetic layer has an octagon or trapezoid structure, and wherein the magnetic layer has sidewall surfaces which comprise a first pair of sidewall surfaces adjoin the bottom surface and a second pair of sidewall surfaces adjoin the first pair of sidewall surfaces wherein the first pair of sidewall surfaces are vertical to the bottom surface of the magnetic layer; and the second pair of sidewall surfaces taper gradually toward the top surface of the magnetic layer; an oxide layer formed adjacent to magnetic layer; a second dielectric layer formed over the magnetic layer and the oxide layer; and a second metal layer formed on a second dielectric layer. - View Dependent Claims (13, 14, 15)
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Specification