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Method for manufacturing polishing pad

  • US 9,050,707 B2
  • Filed: 06/14/2013
  • Issued: 06/09/2015
  • Est. Priority Date: 04/19/2006
  • Status: Expired due to Fees
First Claim
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1. A method for manufacturing a laminated polishing pad, comprising the steps of:

  • preparing a cell-dispersed urethane composition by a mechanical foaming method;

    feeding a cushion layer in a feeding direction;

    while feeding the cushion layer, feeding in the feeding direction a first spacer on the cushion layer so as to be at one end of a width direction of the cushion layer, feeding in the feeding direction a second spacer on the cushion layer so as to be at other end of the width direction of the cushion layer, and feeding in the feeding direction a third spacer on the cushion layer so as to be between the first and second spacers;

    continuously discharging said cell-dispersed urethane composition onto a part of said cushion layer where the spacers are not provided;

    laminating a face material on said discharged cell-dispersed urethane composition;

    curing the cell-dispersed urethane composition to form a polishing layer comprising a polyurethane foam, while controlling its thickness to be uniform, so that a long laminated sheet is formed; and

    cutting the long laminated sheet.

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