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Activated gas injector, film deposition apparatus, and film deposition method

  • US 9,053,909 B2
  • Filed: 08/26/2009
  • Issued: 06/09/2015
  • Est. Priority Date: 08/29/2008
  • Status: Active Grant
First Claim
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1. An activated gas injector comprising:

  • a flow passage defining member having an enclosed space surrounded by circumferential walls extending longer in a first horizontal direction than in a vertical direction, the circumferential walls including a ceiling wall, a bottom wall and first and second side walls, the enclosed space being partitioned into a gas activation chamber and a gas introduction chamber by a partition wall, all of the gas activation chamber, the gas introduction chamber and the partition wall extending longer in the first horizontal direction than in the vertical direction, the gas introduction chamber being defined by the ceiling wall, the first side wall, the bottom wall of the circumferential walls and the partition wall along the first horizontal direction, the gas activation chamber being defined by the ceiling wall, the second side wall and the bottom wall of the circumference walls and the partition wall along the first horizontal direction, a first distance between the first side wall and the partition wall within the gas introduction chamber being longer than a second distance between the second side wall and the partition wall within the gas activation chamber in a second horizontal direction perpendicular to the first horizontal direction within a horizontal plane, the partition wall having a plurality of cut-out portions to form through-holes to allow the gas introduction chamber to be communicated with the gas activation chamber, the through-holes being defined by the ceiling wall of the circumferential walls and the cut-out portions of the partition wall arranged at predetermined first intervals in the first horizontal direction along the ceiling wall;

    a gas introduction nozzle through which a process gas is introduced into the gas introduction chamber, the gas introduction nozzle being provided in the gas introduction chamber extending along an inner surface of the first side wall of the circumferential walls, the gas introduction nozzle extending along the first horizontal direction, the gas introduction nozzle having a plurality of gas discharge holes arranged at predetermined second intervals different from the first intervals along the first horizontal direction;

    a pair of electrodes provided in the gas activation chamber and to be supplied with electrical power to activate the process gas so as to form a plasma generation portion therebetween, wherein the pair of electrodes extends along the first horizontal direction in parallel to each other within the horizontal plane in the gas activation chamber defined by the ceiling wall, the bottom wall and the second side wall of the circumferential walls and the partition wall, the pair of electrodes including a first electrode on the partition wall side and a second electrode on the second side wall side of the circumferential wall, a third distance between the gas introduction nozzle and the partition wall being longer than a fourth distance between the first electrode and the partition wall; and

    gas ejection holes provided in the gas activation chamber along the longitudinal direction of the electrodes, the gas ejection holes being formed in one of the circumferential walls that are at the same distance from both of the electrodes and right under the plasma generation portion, wherein the gas ejection holes allow the process gas activated in the gas activation chamber to be ejected therefrom to outside of the circumferential walls.

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