Lithographic apparatus and device manufacturing method

• US 9,057,967 B2
• Filed: 07/30/2009
• Issued: 06/16/2015
• Est. Priority Date: 11/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Lof, Joeri, Butler, Hans, Donders, Sjoerd Nicolaas Lambertus, Kolesnychenko, Aleksey Yurievich, Loopstra, Erik Roelof, Meijer, Hendricus Johannes Maria, Mertens, Jeroen Johannes Sophia Maria, Mulkens, Johannes Catharinus Hubertus, Ritsema, Roelof Aeilko Siebrand, Van Schaik, Frank, Sengers, Timotheus Franciscus, Simon, Klaus, De Smit, Joannes Theodoor, Straaijer, Alexander, Van Santen, Helmar
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US12/512,754
• Publication Number:
  US 20090290135A1
• Time in Patent Office: 2,147 Days
• Field of Search: 355/30, 355/55, 355/53, 355 67- 77, 250/548, 356399-401
• US Class Current: 1/1
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

Claims

1. A substrate handling system for a lithographic apparatus, comprising;

a substrate table including a substrate holder constructed to hold a substrate;

a surrounding structure surrounding an entire periphery of the substrate holder;

a sensor configured to determine a relative height of a primary surface of the substrate and a primary surface of the surrounding structure;

an actuator configured to move the substrate table and the surrounding structure relative to each other at least in a direction perpendicular to the primary surface of the surrounding structure between a first position in which the surrounding structure contacts the substrate table and a second position in which the surrounding structure is out of contact with the substrate table; and

a controller configured to drive the actuator to move the substrate table and the surface of the surrounding relative to each other, making use of the relative height, to a position so that the primary surface of the substrate, when held on the substrate table, is substantially level with the primary surface of the surrounding structure.

2. The system according to claim 1, wherein the sensor comprises a level difference sensor.

3. The system according to claim 1, wherein the sensor is configured to determine the relative height at a plurality of distinct locations on the substrate.

4. The system according to claim 3, wherein the actuator comprises a plurality of actuators, each of the plurality of actuators configured to be driven individually by the controller.

5. The system according to claim 4, wherein each of the plurality of actuators is driven by the controller to move the substrate table and the primary surface of the surrounding structure relative to each other to a position where, at the plurality of distinct locations, the primary surface of the substrate being held by the substrate table is substantially level with the primary surface of the surrounding structure.

6. A device manufacturing method, comprising:

positioning a substrate table and a surface of a surrounding structure, that surrounds an entire periphery of a substrate holder of the substrate table, relative to each other to a position where a surface of a substrate held on the substrate table is substantially level with the surface of the surrounding structure, the substrate table and the surrounding structure movable relative to each other between a first position in which the surrounding structure contacts the substrate table and a second position in which the surrounding structure is out of contact with the substrate table; and

projecting a patterned beam of radiation onto the substrate.

7. The method according to claim 6, wherein the patterned beam is projected using an optical element.

8. The method according to claim 7, wherein the optical element comprises an immersion fluid reservoir.

9. The method according to claim 6, further comprising determining a relative height of the surface of the substrate and the surface of the surrounding structure and using the relative height in said positioning.

10. The method according to claim 6, comprising positioning the substrate table and the surface of the surrounding structure relative to each other to a position where, at a plurality of distinct locations, the surface of the substrate being held by the substrate table is substantially level with the surface of the surrounding structure.