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Method for estimating the lifespan of a deep-sub-micron integrated electronic circuit

  • US 9,058,574 B2
  • Filed: 06/30/2010
  • Issued: 06/16/2015
  • Est. Priority Date: 07/01/2009
  • Status: Expired due to Fees
First Claim
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1. A method for estimating the lifetime of a deep-submicron-generation integrated electronic component, linked to a wear mechanism occurring in previously defined special conditions of use, said component being of a deep submicron type, with very large-scale integration, commercially available off the shelf, wherein it is assumed that the same sample population always experiences a failure due to the most predominant failure mechanism, during the period of useful life, described by an exponential law, and the most critical wear mechanism, represented by a Weibull distribution at the end of the previous period, the method comprising:

  • receiving and storing predefined elements of technical information about the component, including the power supply voltage, technological data, a technical description of the encapsulation and the addressing data for the component,analyzing the component'"'"'s sensitivity with regard to specific conditions of use,selecting the most critical bottom of the bath and wear mechanisms, and associated accelerated tests,calculating an estimated lifetime for the component in test conditions, anddetermining an acceleration factor used for analyzing the results of at least one accelerated test of the component,wherein, when calculating the estimated lifetime for the component in test conditions, the probability of failures is described by a bimodal distribution (Eq.

         1) in which λ

    TEST is the failure rate under test conditions, TTFTEST

    R % the mean value of the time to failure for components that have survived after t=tTEST and β

    the Weibull slope of the wear mechanism;

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