Anti-reflective coating for photolithography and methods of preparation thereof
First Claim
Patent Images
1. An absorbing composition formed from the constituents consisting of:
- tetraethoxysilane (TEOS);
methyltriethoxysilane (MTEOS);
at least one incorporatable absorbing compound, wherein the incorporatable absorbing compound comprises two or more benzene rings;
at least one material modification agent comprising γ
-aminopropyltriethoxysilane (APTEOS);
at least one catalyst comprising an acid; and
at least one solvent.
1 Assignment
0 Petitions
Accused Products
Abstract
Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
-
Citations
20 Claims
-
1. An absorbing composition formed from the constituents consisting of:
-
tetraethoxysilane (TEOS); methyltriethoxysilane (MTEOS); at least one incorporatable absorbing compound, wherein the incorporatable absorbing compound comprises two or more benzene rings; at least one material modification agent comprising γ
-aminopropyltriethoxysilane (APTEOS);at least one catalyst comprising an acid; and at least one solvent. - View Dependent Claims (6)
-
-
2. An absorbing composition formed from the constituents consisting of:
-
tetraethoxysilane (TEOS); methyltriethoxysilane (MTEOS); at least one incorporatable absorbing compound; γ
-aminopropyltriethoxysilane (APTEOS);at least one catalyst comprising nitric acid, hydrochloric acid, lactic acid, acetic acid, oxalic acid, succinic acid or maleic acid; and at least one solvent. - View Dependent Claims (3, 4, 5, 7, 8, 9, 10, 12, 13, 14, 15)
-
-
11. An absorbing composition formed from the constituents consisting of:
-
tetraethoxysilane (TEOS); methyltriethoxysilane (MTEOS); at least one incorporatable absorbing compound; at least one material modification agent comprising γ
-aminopropyltriethoxysilane (APTEOS);at least one catalyst comprising an acid, wherein the catalyst comprises nitric acid; and at least one solvent. - View Dependent Claims (16, 17, 18, 19, 20)
-
Specification