Method and apparatus for fractional skin treatment
First Claim
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1. An RF skin treatment apparatus, comprising:
- an RF voltage source configured to connect to a tip to apply an RF pulse to skin in order to achieve a desired skin effect; and
at least one processor configured to;
monitor skin impedance as the RF pulse is applied to the skin;
compare the monitored skin impedance to at least one of a pre-set lower threshold or a pre-set upper threshold;
provide at least one of;
a) a wet skin notification to an operator of the skin treatment apparatus indicative of a need to dry the skin when the monitored skin impedance is below the pre-set lower threshold;
orb) a tip notification to the operator indicative of at least one of a need to check for proper attachment of the tip or a need to clean the tip when the monitored skin impedance is above the pre-set upper threshold; and
increase a time of the RF pulse when the monitored skin impedance is below the pre-set lower threshold until an increase in resistance is detected.
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Abstract
An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.
36 Citations
22 Claims
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1. An RF skin treatment apparatus, comprising:
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an RF voltage source configured to connect to a tip to apply an RF pulse to skin in order to achieve a desired skin effect; and at least one processor configured to; monitor skin impedance as the RF pulse is applied to the skin; compare the monitored skin impedance to at least one of a pre-set lower threshold or a pre-set upper threshold; provide at least one of; a) a wet skin notification to an operator of the skin treatment apparatus indicative of a need to dry the skin when the monitored skin impedance is below the pre-set lower threshold;
orb) a tip notification to the operator indicative of at least one of a need to check for proper attachment of the tip or a need to clean the tip when the monitored skin impedance is above the pre-set upper threshold; and increase a time of the RF pulse when the monitored skin impedance is below the pre-set lower threshold until an increase in resistance is detected. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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Specification