Gas barrier film

• US 9,090,780 B2
• Filed: 09/04/2012
• Issued: 07/28/2015
• Est. Priority Date: 09/07/2011
• Status: Active Grant

• Current Assignee: Toray Industries Incorporated
• Original Assignee: Toray Industries Incorporated
• Inventors: Uebayashi, Hiroyuki, Yoshida, Minoru
• Primary Examiner(s): Sample, David
• Assistant Examiner(s): Gugliotta, Nicole T
• Application Number:
  US14/342,103
• Publication Number:
  US 20140370260A1
• Time in Patent Office: 1,057 Days
• Field of Search: None
• US Class Current: 1/1
• CPC Class Codes: B32B 9/00 Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
• CPC Class Codes: C09D 1/00 Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
• CPC Class Codes: C23C 14/06 characterised by the coating material C23C14/0021 , C23C14/04 take precedence
• CPC Class Codes: C23C 14/0629 of zinc, cadmium or mercury
• CPC Class Codes: C23C 14/08 Oxides C23C14/10 takes precedence
• CPC Class Codes: C23C 14/081 of aluminium, magnesium or beryllium
• CPC Class Codes: C23C 14/086 of zinc, germanium, cadmium, indium, tin, thallium or bismuth
• CPC Class Codes: C23C 14/10 Glass or silica
• CPC Class Codes: C23C 14/3407 Cathode assembly for sputtering apparatus, e.g. Target
• CPC Class Codes: C23C 14/562 for coating elongated substrates
• CPC Class Codes: C23C 16/401 containing silicon
• CPC Class Codes: C23C 16/45555 applied in non-semiconductor technology
• CPC Class Codes: Y10T 428/24992 Density or compression of components

Abstract

The present invention provides a gas barrier film which has high gas barrier performance and excellent repeated reproducibility of the gas barrier performance. A gas barrier film of the present invention comprises three inorganic compound layers (layer [A], layer [B] and layer [C]) that are sequentially arranged in this order on at least one surface of a polymer film base. The layer [B] has a thickness of 0.2-20 nm and a density that is higher than those of the layer [A] and the layer [C].

Claims

1. Gas barrier film comprising a polymer base film laminated, on at least one of the surfaces thereof, with a gas barrier layer, the gas barrier layer having a layer structure in which a layer [A], a layer [B], and a layer [C], in contact with each other, are stacked in this order on the polymer base film, the layer [A] and the layer [C] each having a density in the range of 2.0 to 9.0 g/cm³, and the layer [B] having a density that is in the range of 2.3 to 10.5 g/cm³ and higher than the densities of the layer [A] and layer [C] and having a thickness of 0.2 to 20 nm, wherein the layer [A] and the layer [B] contain a zinc (Zn) compound as the primary component while the layer [C] contains, as the primary component, a compound containing at least one element selected from the group consisting of silicon (Si), aluminum (Al), titanium (Ti), zirconium (Zr), and chromium (Cr), the density of the layer [B] being higher by 0.1 to 2.0 g/cm³ than the density of the layer [A].

2. Gas barrier film as described in claim 1, wherein the density of the layer [A] is higher than the density of the layer [C].

3. Gas barrier film as described in claim 1, wherein the density of the layer [A] is 3.9 to 4.6 g/cm³;

the density of the layer [B] is 4.0 to 5.8 g/cm³; and

the density of the layer [C] is 2.0 to 5.5 g/cm³.

4. Gas barrier film as described in claim 3, wherein the layer [C] contains a silicon (Si) compound as the primary component and has a density of 2.0 to 2.6 g/cm³.

5. Gas barrier film as described in claim 3, wherein the layer [C] contains, as the primary component, a compound containing at least one element selected from the group consisting of aluminum (Al), titanium (Ti), zirconium (Zr), and chromium (Cr) and has a density of 3.5 to 5.5 g/cm³.

6. Gas barrier film comprising a polymer base film laminated, on at least one of the surfaces thereof, with a gas barrier layer, the gas barrier layer having a layer structure in which a layer [A], a layer [B], and a layer [C], in contact with each other, are stacked in this order on the polymer base film, the layer [A] and the layer [C] each having a density in the range of 2.0 to 9.0 g/cm³, and the layer [B] having a density that is in the range of 2.3 to 10.5 g/cm³ and higher than the densities of the layer [A] and layer [C] and having a thickness of 0.2 to 20 nm, wherein the layer [A] is either a layer [A1] or a layer [A2] as specified below:

layer [A1];

a layer of a phase in which zinc oxide, silicon dioxide, and aluminum oxide coexist,

layer [A2];

a layer of a phase in which zinc sulfide and silicon dioxide coexist.

7. Gas barrier film as described in claim 6, wherein the layer [A] is a layer [A1] as specified above and has a zinc (Zn) atom concentration of 20 to 40 atom %, a silicon (Si) atom concentration of 5 to 20 atom %, an aluminum (Al) atom concentration of 0.5 to 5 atom %, and an oxygen (O) atom concentration of 35 to 70 atom % as determined by ICP emission spectroscopy analysis.

8. Gas barrier film as described in claim 6, wherein the layer [A] is a layer [A2] as specified above in which zinc sulfide accounts for a mole fraction of 0.7 to 0.9 of the total for zinc sulfide and silicon dioxide.