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Transistor structure having a trench drain

  • US 9,093,300 B2
  • Filed: 03/04/2014
  • Issued: 07/28/2015
  • Est. Priority Date: 10/09/2008
  • Status: Active Grant
First Claim
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1. A device comprising:

  • a tub region of a transistor having a first depth, wherein the tub region includes at least a portion of a channel region of the transistor;

    a first trench in a drain region of the transistor having a second depth greater than or equal to the first depth; and

    a second trench formed within a surface of the first trench such that second trench is disposed below the first trench.

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