Lithographic apparatus and device manufacturing method

• US 9,097,987 B2
• Filed: 04/19/2013
• Issued: 08/04/2015
• Est. Priority Date: 11/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Hoogendam, Christiaan Alexander, Derksen, Antonius Theodorus Anna Maria, Donders, Sjoerd Nicolaas Lambertus, Lof, Joeri, Loopstra, Erik Roelof, Mulkens, Johannes Catharinus Hubertus, Jansen, Hans, Verspay, Jacobus Johannus Leonardus Hendricus, Straaijer, Alexander, Streefkerk, Bob
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US13/866,879
• Publication Number:
  US 20130235358A1
• Time in Patent Office: 837 Days
• Field of Search: 355/55, 355/53, 355/30, 355/63, 355/72, 355/75, 355/77, 250/548, 250/492.2, 359/380
• US Class Current: 1/1
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
• CPC Class Codes: G03F 9/7088 Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Abstract

A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Claims

1. A lithographic projection apparatus comprising:

a substrate table by which a substrate is held;

a projection system by which a patterned beam is projected onto a target portion of the substrate, liquid being provided to a space between the projection system and the substrate and being confined in said space by a seal member; and

a member having a first side and a second side opposite from the first side, the member being removably positionable adjacent to the projection system between the projection system and the substrate table so that the first side faces the projection system and the second side faces the substrate table to isolate the space provided with the liquid which contacts the first side of the member from a second space located on the second side of the member, wherein the member is separable from the substrate table and the projection system, and wherein the member is positionable on the substrate table so that the first side is substantially coplanar with a top surface of the substrate table that receives the substrate,

wherein, in use, the liquid is at least partly recovered from underneath the seal member through a surface of the seal member that faces the substrate, or the top surface of the substrate table or both.

2. The apparatus according to claim 1, wherein the member is positionable opposite the projection system such that liquid can be confined between the projection system and the member.

3. The apparatus according to claim 1, wherein the member is releasably connectable to an object in the apparatus.

4. The apparatus according to claim 3, further comprising a vacuum-clamp by which the member is releasably connectable to the object.

5. The apparatus according to claim 1, wherein the member is positionable on the substrate table so that the first side of the member is substantially coplanar with a primary surface of the substrate.

6. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate;

a liquid supply system configured to provide liquid to a space between the projection system and the substrate, the liquid supply system comprising a seal member that is configured to confine the liquid in said space; and

a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate, wherein the shutter is positionable on the substrate table so that a primary surface of the shutter is substantially coplanar with a top surface of the substrate table that receives the substrate,

wherein, in use, the liquid is at least partly recovered from underneath the seal member through a surface of the seal member that faces the substrate, or the top surface of the substrate table or both.

7. The apparatus according to claim 6, wherein the shutter is positionable on a side of the liquid supply system opposite the projection system such that liquid can be confined in the liquid supply system and between the projection system and the shutter.

8. The apparatus according to claim 6, wherein the shutter is releasably connectable to the liquid supply system.

9. The apparatus according to claim 8, wherein the shutter is separable from the remainder of the apparatus.

10. The apparatus according to claim 8, wherein the shutter is displaced from the liquid supply system when connected to the liquid supply system.

11. The apparatus according to claim 10, comprising a magnet, a vacuum outlet, or both, configured to connect the shutter to the liquid supply system.

12. The apparatus according to claim 10, wherein the liquid supply system comprises a gas inlet and a vacuum outlet configured to form a seal between the liquid supply system and the shutter.

13. The apparatus according to claim 6, wherein the shutter comprises a channel in a surface of the shutter facing the projection system.

14. The apparatus according to claim 13, wherein the channel is less than or equal to 10 micrometers deep.

15. The apparatus according to claim 13, wherein the shutter comprises a plurality of concentric channels.

16. The apparatus according to claim 13, wherein the shutter comprises a plurality of radial channels.

17. The apparatus according to claim 6, wherein the liquid supply system comprises at least one inlet to supply the liquid onto the substrate and at least one outlet to remove the liquid after the liquid has passed under the projection system.

18. The apparatus according to claim 6, wherein the liquid supply system is configured to provide the liquid to a space between a final lens of the projection system and the substrate.

19. The apparatus according to claim 6, wherein the shutter is positionable on the substrate table so that the primary surface is substantially coplanar with a primary surface of the substrate.