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Semiconductor device and method of fabricating the same

  • US 9,099,355 B2
  • Filed: 05/24/2012
  • Issued: 08/04/2015
  • Est. Priority Date: 03/06/2000
  • Status: Expired due to Term
First Claim
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1. A display device comprising:

  • a pixel electrode over a substrate;

    a first insulating film over the pixel electrode;

    an alignment film over the first insulating film;

    a liquid crystal layer over the alignment film; and

    a thin film transistor, the thin film transistor comprising;

    a gate electrode over the substrate;

    a second insulating film over the gate electrode;

    a first semiconductor film over the second insulating film;

    a second semiconductor film comprising an impurity element which imparts n-type conductivity,a first electrode over the second semiconductor film; and

    a second electrode over the second semiconductor film,wherein the pixel electrode comprises a transparent conductive material and is electrically connected to the first electrode,wherein the first insulating film is over the first semiconductor film and is in contact with the first semiconductor film,wherein the alignment film is in contact with the first insulating film,wherein the liquid crystal layer is in contact with the alignment film,wherein the second semiconductor film is in contact with the first semiconductor film and the first electrode,wherein the first electrode and the second electrode comprise a metal layer,wherein the pixel electrode overlaps with the second insulating film,wherein the gate electrode is electrically connected to a terminal portion, andwherein the terminal portion is formed in an edge portion of the substrate.

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