Control of uniformity in a surface wave plasma source
First Claim
1. A surface wave plasma source (SWPS), comprising:
- an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface located adjacent said plasma, said EM wave launcher comprising a slot antenna having a plurality of slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna;
a dielectric window positioned in said second region and having a lower surface of said dielectric window including said plasma surface;
an attenuation assembly disposed between said slot antenna and said plasma surface, wherein said attenuation assembly includes a first fluid channel substantially aligned with a first arrangement of slots in said plurality of slots and configured to receive a first flow of a first fluid at a first fluid temperature;
a fluid supply system coupled to said first fluid channel and configured to supply said first flow of said first fluid through said first fluid channel;
a fluid temperature control system configured to selectably add or remove heat from said first fluid; and
a power coupling system coupled to said EM wave launcher and configured to provide said EM energy to said EM wave launcher for forming said plasma.
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Accused Products
Abstract
A surface wave plasma source (SWPS) is disclosed, having an electromagnetic (EM) wave launcher including a slot antenna configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the SWPS adjacent the plasma. The SWPS also includes a dielectric window positioned below the slot antenna, having a lower surface and the plasma surface. The SWPS further includes an attenuation assembly disposed between the slot antenna and the plasma surface. The attenuation assembly includes a first fluid channel substantially aligned with a first arrangement of slots in the slot antenna, and is configured to receive a first flow of a first fluid at a first fluid temperature. The SWPS finally includes a power coupling system coupled to the EM wave launcher and configured to provide EM energy to the EM wave launcher for forming the plasma.
16 Citations
20 Claims
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1. A surface wave plasma source (SWPS), comprising:
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an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface located adjacent said plasma, said EM wave launcher comprising a slot antenna having a plurality of slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna; a dielectric window positioned in said second region and having a lower surface of said dielectric window including said plasma surface; an attenuation assembly disposed between said slot antenna and said plasma surface, wherein said attenuation assembly includes a first fluid channel substantially aligned with a first arrangement of slots in said plurality of slots and configured to receive a first flow of a first fluid at a first fluid temperature; a fluid supply system coupled to said first fluid channel and configured to supply said first flow of said first fluid through said first fluid channel; a fluid temperature control system configured to selectably add or remove heat from said first fluid; and a power coupling system coupled to said EM wave launcher and configured to provide said EM energy to said EM wave launcher for forming said plasma. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A surface wave plasma source (SWPS), comprising:
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an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface located adjacent said plasma, said EM wave launcher comprising a slot antenna having a plurality of slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna; a dielectric window positioned in said second region and having a lower surface of said dielectric window including said plasma surface; an attenuation assembly disposed between said slot antenna and said plasma surface, wherein said attenuation assembly includes a first fluid channel substantially aligned with a first arrangement of slots in said plurality of slots and configured to receive a first flow of a first fluid at a first fluid temperature, wherein said first fluid channel includes an EM-transparent duct disposed therein, and configured to form a fluid-tight barrier between said first fluid channel and said first fluid; and a power coupling system coupled to said EM wave launcher and configured to provide said EM energy to said EM wave launcher for forming said plasma. - View Dependent Claims (14, 15)
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16. A method for controlling plasma properties in a surface wave plasma source (SWPS), comprising:
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providing an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface located adjacent said plasma, said EM wave launcher comprising a slot antenna having a plurality of slots formed therethrough configured to couple said EM energy from a first region above said slot antenna to a second region below said slot antenna; positioning a dielectric window in said second region and having a lower surface of said dielectric window including said plasma surface, disposing an attenuation assembly between said slot antenna and said plasma surface, wherein said attenuation assembly includes a first fluid channel substantially aligned with a first arrangement of slots in said plurality of slots and configured to receive a first flow of a first fluid at a first fluid temperature; coupling a power coupling system to said EM wave launcher configured to provide said EM energy to said EM wave launcher for forming said plasma; controlling a plasma property of said plasma by adjusting a dielectric property of said attenuation assembly, wherein said adjusting is of said first fluid temperature; providing a fluid supply system coupled to said first fluid channel and configured to supply said first flow of said first fluid through said first fluid channel;
a fluid temperature control system configured to selectably add or remove heat from said first fluid;
a controller electrically coupled to said fluid temperature control system and said fluid supply system and configured to adjust a magnitude of said first fluid temperature and a speed of said first fluid flow; and
a sensor array configured to detect said magnitude of said first fluid temperature entering or exiting said attenuation assembly and to detect said speed of said first fluid flow; andusing said controller, said sensor array, said fluid temperature control system, and said fluid supply system to adjust a magnitude of said first fluid temperature and a speed of said first fluid flow to maintain a fluid metric during semiconductor processing. - View Dependent Claims (17, 18, 19, 20)
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Specification