Periodic patterns and technique to control misalignment between two layers
First Claim
1. A method for measuring a relative position between a first and a second layer of a device, a first periodic structure having been formed with the first layer of the device and a second periodic structure having been formed with the second layer of the device, said second periodic structure overlying said first periodic structure, said method comprising:
- measuring a line width of at least one of the first and second periodic structures, said measuring including detecting a diffraction of electromagnetic radiation from the first and second periodic structures, wherein measurement of at least one of the first and second periodic structures is performed without measuring the other one of the first and second periodic structures; and
measuring a relative position between the first and second layers, wherein said measuring of the relative position includes determining a misalignment between the first and second periodic structures;
wherein said second periodic structure includes a first and a second portion, wherein the first portion is in a region overlying the first periodic structure and the second portion is in a region not overlying the first periodic structure, and said line width of the second periodic structure is measured by measuring said second portion of said second periodic structure.
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Abstract
A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
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Citations
3 Claims
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1. A method for measuring a relative position between a first and a second layer of a device, a first periodic structure having been formed with the first layer of the device and a second periodic structure having been formed with the second layer of the device, said second periodic structure overlying said first periodic structure, said method comprising:
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measuring a line width of at least one of the first and second periodic structures, said measuring including detecting a diffraction of electromagnetic radiation from the first and second periodic structures, wherein measurement of at least one of the first and second periodic structures is performed without measuring the other one of the first and second periodic structures; and measuring a relative position between the first and second layers, wherein said measuring of the relative position includes determining a misalignment between the first and second periodic structures; wherein said second periodic structure includes a first and a second portion, wherein the first portion is in a region overlying the first periodic structure and the second portion is in a region not overlying the first periodic structure, and said line width of the second periodic structure is measured by measuring said second portion of said second periodic structure. - View Dependent Claims (2, 3)
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Specification