Etching apparatus and etching method
First Claim
1. An etching apparatus, comprising:
- a chamber;
a plasma generator in the chamber;
a stacked structure in the chamber to support a substrate thereon, the stacked structure including an electrode plate and an insulation coating layer on the electrode plate;
electrode rods inserted into holes of the stacked structure to directly contacting the substrate, the electrode rods being spaced apart from sidewalls of the respective ones of the holes;
at least one DC pulse generator to provide a DC pulse to the electrode plate and the electrode rods;
first connection lines connecting the DC pulse generator to the electrode rods; and
at least one second connection line connecting the DC pulse generator to a lower portion of the electrode plate.
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Accused Products
Abstract
An apparatus for an etching process includes a chamber, a plasma generator disposed in the chamber, a stacked structure disposed in the chamber to support a substrate thereon and including an electrode plate and an insulation coating layer on the electrode plate, electrode rods inserted into through holes of the stacked structure to penetrate through the stacked structure, directly contacting the substrate and spaced apart from sidewalls of the through holes of the stacked structure, at least one DC pulse generator generating a DC pulse to the electrode plate and the electrode rods, first connection lines connecting the DC pulse generator to the electrode rods, and at least one second connection line connecting the DC pulse generator to a lower portion of the electrode plate.
42 Citations
14 Claims
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1. An etching apparatus, comprising:
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a chamber; a plasma generator in the chamber; a stacked structure in the chamber to support a substrate thereon, the stacked structure including an electrode plate and an insulation coating layer on the electrode plate; electrode rods inserted into holes of the stacked structure to directly contacting the substrate, the electrode rods being spaced apart from sidewalls of the respective ones of the holes; at least one DC pulse generator to provide a DC pulse to the electrode plate and the electrode rods; first connection lines connecting the DC pulse generator to the electrode rods; and at least one second connection line connecting the DC pulse generator to a lower portion of the electrode plate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. An apparatus, comprising:
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a base to support a substrate; a plurality of electrode rods extending through holes in the base; and at least one voltage control circuit coupled to one or more of the plurality of electrode rods, wherein the electrode rods accelerate reactive ions of plasma toward the substrate in response to a first voltage signal and wherein the at least one voltage control circuit adjusts a voltage level of the first voltage signal to control an electric potential of the base. - View Dependent Claims (11, 12, 13, 14)
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Specification