LEDs with efficient electrode structures
First Claim
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1. A Light Emitting Diode (LED) device, comprising:
- a Gallium-Nitride (GaN) based semiconductor structure comprising an active region, the active region being in electrical contact with a P doped region formed to have a generally planar surface, through which light generated in the active region can be emitted; and
a metallic electrode structure, comprising a bonding pad area, the metallic electrode structure formed in electrical contact with the planar surface of the P-doped region, wherein a physical interface between the bonding pad area and the planar surface comprises a single layer of dielectric material interposed between the planar surface and the bonding pad area, the single layer of dielectric material being non-perforated and porous, and defining a region of total internal reflection between the metallic electrode structure and the GaN based semiconductor structure.
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Abstract
Aspects include Light Emitting Diodes that have a GaN-based light emitting region and a metallic electrode. The metallic electrode can be physically separated from the GaN-based light emitted region by a layer of porous dielectric, which provides a reflecting region between at least a portion of the metallic electrode and the GaN-based light emitting region.
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Citations
16 Claims
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1. A Light Emitting Diode (LED) device, comprising:
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a Gallium-Nitride (GaN) based semiconductor structure comprising an active region, the active region being in electrical contact with a P doped region formed to have a generally planar surface, through which light generated in the active region can be emitted; and a metallic electrode structure, comprising a bonding pad area, the metallic electrode structure formed in electrical contact with the planar surface of the P-doped region, wherein a physical interface between the bonding pad area and the planar surface comprises a single layer of dielectric material interposed between the planar surface and the bonding pad area, the single layer of dielectric material being non-perforated and porous, and defining a region of total internal reflection between the metallic electrode structure and the GaN based semiconductor structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. An electrode for a Light Emitting Diode (LED) semiconductor device, the electrode structure comprising:
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a metallic structure formed in electrical contact with a surface of a P-doped region of the semiconductor, and comprising a bonding pad area; and a porous layer of dielectric material physically disposed between the bonding pad area and the planar surface of the P-doped region, wherein the porous layer of material forms a physical interface comprising a reflective region capable of reflecting at least 85% of light incident at angles between about zero degrees and about fifteen degrees. - View Dependent Claims (11, 12, 13, 14, 15, 16)
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Specification