Solution processing apparatus, solution processing method, and non-transitory computer-readable recording medium
First Claim
1. An apparatus configured to perform a solution process by supplying a processing solution from a processing solution supply source to the substrate held on a substrate holder via a flow path member and a nozzle, the apparatus comprising:
- a solution transfer unit configured to transfer the processing solution to the nozzle, and mounted to the flow path member;
an ultrasonic flowmeter mounted to the flow path member at a downstream side from the solution transfer unit;
a bubble detection unit configured to detect a bubble in the processing solution based on a variation of flow rates measured by the ultrasonic flowmeter;
a bubble trap mounted to the flow path member at a downstream side from the ultrasonic flowmeter;
a valve mounted to the flow path member at a downstream side from the bubble trap; and
a control unit configured to control the bubble to be discharged by closing the valve and supplying the processing solution to the bubble trap if a number of times when the ultrasonic flowmeter detects the bubble exceeds a threshold,wherein a lower limit of a flow rate range which is measured by the ultrasonic flowmeter is equal to or less than 1 mL/sec, andwherein the ultrasonic flowmeter includes;
a first piezoelectric element and a second piezoelectric element, which are spaced apart from each other in a flow direction of the processing solution, and are formed in a circular shape to surround a periphery of the flow path member; and
a measuring unit configured to measure the flow rate of the processing solution, based on a variation of ultrasonic propagation times between when ultrasonic is propagated from the first piezoelectric element to the second piezoelectric element and when the ultrasonic is propagated from the second piezoelectric element to the first piezoelectric element.
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Accused Products
Abstract
According to an embodiment of the present disclosure, an apparatus is configured to perform a solution process by supplying a processing solution from a processing solution supply source to the substrate held on a substrate holder via a flow path member and a nozzle at a flow rate equal to or less than 1 mL/sec. The apparatus includes a solution transfer unit configured to transfer the processing solution to the nozzle, and mounted to the flow path member, and an ultrasonic flowmeter mounted to the flow path member at a downstream side from the solution transfer unit. In this embodiment, a lower limit of a flow rate range which is measured by the ultrasonic flowmeter is equal to or less than 1 mL/sec.
11 Citations
15 Claims
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1. An apparatus configured to perform a solution process by supplying a processing solution from a processing solution supply source to the substrate held on a substrate holder via a flow path member and a nozzle, the apparatus comprising:
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a solution transfer unit configured to transfer the processing solution to the nozzle, and mounted to the flow path member; an ultrasonic flowmeter mounted to the flow path member at a downstream side from the solution transfer unit; a bubble detection unit configured to detect a bubble in the processing solution based on a variation of flow rates measured by the ultrasonic flowmeter; a bubble trap mounted to the flow path member at a downstream side from the ultrasonic flowmeter; a valve mounted to the flow path member at a downstream side from the bubble trap; and a control unit configured to control the bubble to be discharged by closing the valve and supplying the processing solution to the bubble trap if a number of times when the ultrasonic flowmeter detects the bubble exceeds a threshold, wherein a lower limit of a flow rate range which is measured by the ultrasonic flowmeter is equal to or less than 1 mL/sec, and wherein the ultrasonic flowmeter includes; a first piezoelectric element and a second piezoelectric element, which are spaced apart from each other in a flow direction of the processing solution, and are formed in a circular shape to surround a periphery of the flow path member; and a measuring unit configured to measure the flow rate of the processing solution, based on a variation of ultrasonic propagation times between when ultrasonic is propagated from the first piezoelectric element to the second piezoelectric element and when the ultrasonic is propagated from the second piezoelectric element to the first piezoelectric element. - View Dependent Claims (2, 3, 4)
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5. A method for performing a solution process by supplying a processing solution from a processing solution supply source to the substrate held on a substrate holder via a flow path member and a nozzle, the method comprising:
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measuring a flow rate of the processing solution by an ultrasonic flowmeter mounted to the flow path member; detecting a bubble based on a variation in the flow rate; and controlling the bubble to be discharged by closing the valve and supplying the processing solution to the bubble trap using a bubble trap and a valve when the number of times when the ultrasonic flowmeter detects the bubble exceeds a threshold, wherein a lower limit of the flow rate which is measured by the ultrasonic flowmeter is equal to or less than 1 mL/sec, wherein the flow rate of the processing solution is measured using a first piezoelectric element and a second piezoelectric element which are spaced apart from each other in a flow direction of the processing solution and are formed in a circular shape to surround a periphery of the flow path member, based on a variation of ultrasonic propagation times between when ultrasonic is propagated from the first piezoelectric element to the second piezoelectric element and when the ultrasonic is propagated from the second piezoelectric element to the first piezoelectric element, and wherein the bubble trap is mounted to the flow path member at a downstream side from the ultrasonic flowmeter, and the valve is mounted to the flow path member at a downstream side from the bubble trap. - View Dependent Claims (6, 7)
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8. A non-transitory computer-readable recording medium storing a program that causes a computer to execute a method for performing a solution process by supplying a processing solution from a processing solution supply source to the substrate held on a substrate holder via a flow path member and a nozzle, the method comprising:
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measuring a flow rate of the processing solution by an ultrasonic flowmeter mounted to the flow path member; detecting a bubble based on a variation in the flow rate; and controlling the bubble to be discharged by closing the valve and supplying the processing solution to the bubble trap using a bubble trap and a valve when the number of times when the ultrasonic flowmeter detects the bubble exceeds a threshold, wherein a lower limit of the flow rate which is measured by the ultrasonic flowmeter is equal to or less than 1 mL/sec, wherein the flow rate of the processing solution is measured using a first piezoelectric element and a second piezoelectric element which are spaced apart from each other in a flow direction of the processing solution and are formed in a circular shape to surround a periphery of the flow path member, based on a variation of ultrasonic propagation times between when ultrasonic is propagated from the first piezoelectric element to the second piezoelectric element and when the ultrasonic is propagated from the second piezoelectric element to the first piezoelectric element, and wherein the bubble trap is mounted to the flow path member at a downstream side from the ultrasonic flowmeter, and the valve is mounted to the flow path member at a downstream side from the bubble trap.
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9. An apparatus configured to perform a solution process by supplying a processing solution from a processing solution supply source to the substrate held on a substrate holder via a flow path member and a nozzle, the apparatus comprising:
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a solution transfer unit configured to transfer the processing solution to the nozzle, and mounted to the flow path member; an ultrasonic flowmeter mounted to the flow path member at a downstream side from the solution transfer unit; a bubble detection unit configured to detect a bubble in the processing solution based on a variation of flow rates measured by the ultrasonic flowmeter; a solution receiving unit configured to receive the processing solution which is discharged from the nozzle by a dummy dispensing; and a control unit configured to perform the solution processing by discharging the processing solution from the nozzle to the substrate a predetermined number of times, and to perform the dummy dispensing in the solution receiving unit, when the ultrasonic flowmeter detects the bubble, wherein a lower limit of a flow rate range which is measured by the ultrasonic flowmeter is equal to or less than 1 mL/sec, and wherein the ultrasonic flowmeter includes; a first piezoelectric element and a second piezoelectric element, which are spaced apart from each other in a flow direction of the processing solution, and are formed in a circular shape to surround a periphery of the flow path member; and a measuring unit configured to measure the flow rate of the processing solution, based on a variation of ultrasonic propagation times between when ultrasonic is propagated from the first piezoelectric element to the second piezoelectric element and when the ultrasonic is propagated from the second piezoelectric element to the first piezoelectric element. - View Dependent Claims (10, 11, 12)
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13. A method for performing a solution process by supplying a processing solution from a processing solution supply source to the substrate held on a substrate holder via a flow path member and a nozzle, the method comprising:
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measuring a flow rate of the processing solution by an ultrasonic flowmeter mounted to the flow path member; detecting a bubble based on a variation in the flow rate; and controlling to perform a solution process by discharging the processing solution from the nozzle to the substrate a predetermined number of times, and to perform a dummy dispensing in a solution receiving unit, when the ultrasonic flowmeter detects the bubble, wherein a lower limit of the flow rate which is measured by the ultrasonic flowmeter is equal to or less than 1 mL/sec, and wherein the flow rate of the processing solution is measured using a first piezoelectric element and a second piezoelectric element which are spaced apart from each other in a flow direction of the processing solution and are formed in a circular shape to surround a periphery of the flow path member, based on a variation of ultrasonic propagation times between when ultrasonic is propagated from the first piezoelectric element to the second piezoelectric element and when the ultrasonic is propagated from the second piezoelectric element to the first piezoelectric element. - View Dependent Claims (14, 15)
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Specification