Nanowire field-effect transistor and method for manufacturing same
First Claim
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1. A nanowire field-effect transistor comprising:
- an asymmetrical nanowire channel whose both ends have mutually different diameters;
a source region that is adjacent to a region in which the diameter of the nanowire channel is large;
a drain region that is adjacent to a region in which the diameter of the nanowire channel is small;
a gate electrode that encloses the nanowire channel; and
a gate insulation film that is positioned between the nanowire channel and the gate electrode.
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Abstract
Provided are a nanowire field-effect transistor and a method for manufacturing the same. The nanowire field-effect transistor can enable a source region to be positioned, with respect to an asymmetrical nanowire channel, adjacent to a region in which the diameter of the nanowire channel is large, can enable a drain region to be positioned adjacent to a region in which the diameter of the nanowire channel is small, can enable an ON current to be increased in a state in which a threshold voltage level is kept the same, and can enable the current drivability of a gate electrode to be improved.
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13 Claims
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1. A nanowire field-effect transistor comprising:
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an asymmetrical nanowire channel whose both ends have mutually different diameters; a source region that is adjacent to a region in which the diameter of the nanowire channel is large; a drain region that is adjacent to a region in which the diameter of the nanowire channel is small; a gate electrode that encloses the nanowire channel; and a gate insulation film that is positioned between the nanowire channel and the gate electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for manufacturing a nanowire field-effect transistor comprising:
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forming an asymmetrical nanowire whose both ends have mutually different diameters; defining any one of a source region and a drain region by introducing impurities at an end of the nanowire; forming a gate insulation film so as to enclose a part of the nanowire; forming a gate electrode so as to enclose the gate insulation film; and defining the remaining one of the source region and the drain region by introducing the impurities at the other end of the nanowire. - View Dependent Claims (11, 12, 13)
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Specification