Vertical cavity surface emitting laser with undoped top mirror
First Claim
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1. A VCSEL formed on a substrate comprising:
- an epitaxial structure having a laterally narrower mesa structure on a laterally wider base and having a longitudinal axis aligned with a direction of light emitted from the VCSEL;
the mesa structure with a top mesa surface and side mesa surface and containing an undoped top mirror;
the base comprising;
a periodically doped conduction layer coupled to the undoped top mirror and having a top surface extending from the mesa laterally away from the mesa side surface;
an active region coupled to the conduction layer;
an undoped bottom mirror between the active region and substrate; and
a periodically doped spacer layer between the active region and undoped bottom mirror;
a dielectric material on the top surface of the periodically doped conduction layer and having a tapered profile shape from a longitudinally thinner inner portion proximal the mesa side surface to a longitudinally thicker outer portion distal the mesa side surface;
an isolation trench extending from the top surface of the periodically doped conduction layer to the periodically doped spacer layer and having the dielectric material so as to laterally bound the active region;
a first intracavity contact coupled to the periodically doped conduction layer and the undoped top mirror, the first intracavity contact covering a portion of the top mesa surface and extending over the side mesa surface, periodically doped conduction layer, and dielectric material to the longitudinally thicker outer portion; and
a second intracavity contact having a portion in the isolation trench and being coupled to the periodically doped spacer layer.
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Abstract
A VCSEL with undoped top mirror. The VCSEL is formed from an epitaxial structure deposited on a substrate, and a periodically doped conduction layer is coupled to the undoped top minor. A periodically doped spacer layer is coupled to an active region. An undoped bottom minor coupled to the periodically doped spacer layer. A first intracavity contact is coupled to the periodically doped conduction layer and a second intracavity contact is coupled to the periodically doped spacer layer.
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Citations
20 Claims
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1. A VCSEL formed on a substrate comprising:
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an epitaxial structure having a laterally narrower mesa structure on a laterally wider base and having a longitudinal axis aligned with a direction of light emitted from the VCSEL; the mesa structure with a top mesa surface and side mesa surface and containing an undoped top mirror; the base comprising; a periodically doped conduction layer coupled to the undoped top mirror and having a top surface extending from the mesa laterally away from the mesa side surface; an active region coupled to the conduction layer; an undoped bottom mirror between the active region and substrate; and a periodically doped spacer layer between the active region and undoped bottom mirror; a dielectric material on the top surface of the periodically doped conduction layer and having a tapered profile shape from a longitudinally thinner inner portion proximal the mesa side surface to a longitudinally thicker outer portion distal the mesa side surface; an isolation trench extending from the top surface of the periodically doped conduction layer to the periodically doped spacer layer and having the dielectric material so as to laterally bound the active region; a first intracavity contact coupled to the periodically doped conduction layer and the undoped top mirror, the first intracavity contact covering a portion of the top mesa surface and extending over the side mesa surface, periodically doped conduction layer, and dielectric material to the longitudinally thicker outer portion; and a second intracavity contact having a portion in the isolation trench and being coupled to the periodically doped spacer layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A VCSEL formed on a substrate comprising:
an epitaxial structure having a laterally narrower mesa structure on a laterally wider base and having a longitudinal axis aligned with a direction of light emitted from the VCSEL; the mesa structure with a top mesa surface and side mesa surface and containing an undoped top semiconductor mirror having alternating layers of GaAs and AlGaAs; the base comprising; a p-type conduction layer region having two or three periodically doped conduction layers coupled to the undoped top mirror, which two or three periodically doped conduction layers are more heavily p- doped between 5×
1019 to 1×
1020 at electric field minima than when not zero so as to provide a low resistance lateral current path for directing current to a central region of an active region, the conduction layer region having a top surface extending from the mesa laterally away from the mesa side surface;the active region coupled to the p-type conduction layer region; an n-doped periodically doped spacer layer coupled to the active region; and an undoped bottom mirror coupled to the n-doped periodically doped spacer layer, wherein the n-doped periodically doped spacer layer is between the active region and undoped bottom mirror; a dielectric material on the top surface of the conduction layer region and having a tapered profile shape from a longitudinally thinner inner portion proximal the mesa side surface to a longitudinally thicker outer portion distal the mesa side surface; an isolation trench extending from the top surface of the p-type conduction layer to the n-doped periodically doped spacer layer and having the dielectric material so as to laterally bound the active region; a first intracavity contact coupled to one of the two or three periodically doped conduction layers and the undoped top semiconducting mirror, the first intracavity contact covering a portion of the top mesa surface and extending over the side mesa surface, periodically doped conduction layers, and dielectric material; and a second intracavity contact having a portion in the isolation trench and being coupled to the n-type periodically doped spacer layer.
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20. A VCSEL formed on a substrate comprising:
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an epitaxial structure having a laterally narrower mesa structure on a laterally wider base and having a longitudinal axis aligned with a direction of light emitted from the VCSEL; the mesa structure with a top mesa surface and side mesa surface and containing an undoped top semiconductor mirror having alternating layers of GaAs and AlAs under an oxide cap; the base comprising; a p-type conduction layer region having two or three periodically doped conduction layers coupled to the undoped top mirror, which two or three periodically doped conduction layers are more heavily p-doped between 5×
1019 to 1×
1020 at electric field minima than when not zero so as to provide a low resistance lateral current path for directing current to a central region of an active region, the conduction layer region having a top surface extending from the mesa laterally away from the mesa side surface;the active region coupled to the p-type conduction layer region; an n-doped periodically doped spacer layer coupled to the active region; and an undoped bottom mirror coupled to the n-doped periodically doped spacer layer, wherein the n-doped periodically doped spacer layer is between the active region and undoped bottom mirror; a dielectric material on the periodically doped conduction layer region and having a tapered profile shape from a longitudinally thinner inner portion proximal the mesa side surface to a longitudinally thicker outer portion distal the mesa side surface; an isolation trench extending from the top surface of the p-type conduction layer to the n-doped periodically doped spacer layer and having the dielectric material so as to laterally bound the active region; a first intracavity contact coupled to one of the two or three periodically doped conduction layers and the undoped top semiconductor mirror, the first intracavity contact covering a portion of the top mesa surface and extending over the side mesa surface, periodically doped conduction layers, and dielectric material; and a second intracavity contact coupled to the n-type periodically doped spacer layer.
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Specification