Differing boost voltages applied to two or more anodeless electrodes for plasma processing

• US 9,129,776 B2
• Filed: 04/22/2013
• Issued: 09/08/2015
• Est. Priority Date: 11/01/2012
• Status: Active Grant

• Current Assignee: AES Global Holdings Pte Ltd. (Advanced Energy Industries, Inc. (China))
• Original Assignee: Advanced Energy Industries Incorporated
• Inventors: Finley, Kenneth W., Christie, David
• Primary Examiner(s): Owens, Douglas W
• Assistant Examiner(s): King, Monica C
• Application Number:
  US13/867,907
• Publication Number:
  US 20140117861A1
• Time in Patent Office: 869 Days
• US Class Current: 1/1
• CPC Class Codes: H01J 37/32027 DC powered
• CPC Class Codes: H01J 37/32055 Arc discharge
• CPC Class Codes: H01J 37/32064 Circuits specially adapted for controlling the arc discharge for plasma torches H01H1/36
• CPC Class Codes: H01J 37/34 operating with cathodic sputtering H01J37/36 takes precedence ; methods of cathodic sputtering C23C14/34
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence
• CPC Class Codes: H05H 2242/26 Matching networks

Abstract

This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load'"'"'s impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a unidirectional switch, a voltage multiplier, and a current limiter. In some cases, these components can be a diode, voltage doubler, and an inductor, respectively.

Claims

1. A pulsed DC power supply system providing pulsed DC power to a plurality of anodeless electrodes sustaining a plasma in a plasma processing chamber, the pulsed DC power supply system comprising:

a first DC power supply supplying a first DC power to a first and a second rail having a first rail voltage therebetween;

a first switching circuit receiving the first DC power via the first and second rails and converting the first DC power to a first pulsed DC voltage configured for delivery to at least a first anodeless electrode of the plasma processing chamber;

a first voltage-boosting circuit coupled between the first and second rails, the first voltage-boosting circuit including a first voltage multiplier and a first voltage multiplier modifier, the first voltage multiplier configured to draw current from the first DC power supply when an impedance of a plasma load increases thereby raising the first rail voltage by a first boost voltage V₂, the first boost voltage V₂ being selectable by the first voltage multiplier modifier;

a second DC power supply supplying a second DC power to a third and fourth rail having a second rail voltage therebetween;

a second switching circuit receiving the second DC power via the third and fourth rails and converting the second DC power to a second pulsed DC voltage configured for delivery to at least a second anodeless electrode of the plasma processing chamber; and

a second voltage-boosting circuit coupled between the first and second rails, the second voltage-boosting circuit including a second voltage multiplier and a second voltage multiplier modifier, the second voltage multiplier configured to draw current from the second DC power supply when the impedance of the plasma load increases thereby raising the second rail voltage by a second boost voltage V_2′

, the second boost voltage V_2′

being selectable by the second voltage multiplier modifier.

2. The pulsed DC power supply system of claim 1, wherein the first voltage-boosting circuit includes one or more capacitive elements configured to absorb the current from the first DC power supply when the impedance of the plasma load increases.

3. The pulsed DC power supply system of claim 1, wherein the one or more capacitive elements of the first voltage-boosting circuit are arranged to absorb the current in series and to discharge current back to the first rail in parallel.

4. The pulsed DC power supply system of claim 3, wherein a first of the two capacitive elements charges to the process voltage V₁ during a first portion of each pulse, while the second capacitive element charges to the first boost voltage V₂ during the first portion of each pulse.

5. The pulsed DC power supply system of claim 4, wherein the first voltage-boosting circuit includes a switch having a duty cycle that controls a magnitude of the first boost voltage V₂.

6. The pulsed DC power supply system of claim 1, wherein the first voltage multiplier modifier controls a magnitude of the first boost voltage V₂.

7. A pulsed DC power supply system configured to provide pulsed DC power to a plurality of anodeless electrodes of a plasma processing chamber, the pulsed DC power supply comprising:

a first pulsed DC power supply system providing a DC current via a first and second rail;

a first voltage-boosting circuit coupled between the first and second rail and periodically boosting a voltage of the rail by a first selectable boost voltage;

a first switching circuit receiving the DC current via the first and second rail and generating a first pulsed DC voltage that is periodically boosted above a process voltage by the first selectable boost voltage; and

first and second outputs configured to provide the first pulsed DC voltage to first and second anodeless electrodes,

the first selectable boost voltage being different than a second selectable boost voltage configured to be provided to third and fourth anodeless electrodes.

8. The pulsed DC power supply system of claim 7, wherein the second selectable boost voltage is powered from DC current from a second pulsed DC power supply system.

9. The pulsed DC power supply system of claim 8, further comprising a third output configured to provide pulsed DC power to a third anodeless electrode.

10. The pulsed DC power supply system of claim 9, wherein the second pulsed DC power supply system is coupled to the third output.

11. The pulsed DC power supply system of claim 9, wherein the first pulsed DC power supply system is coupled to the third output.

12. The pulsed DC power supply system of claim 7, wherein the first voltage-boosting circuit includes:

a capacitive element between the first and second rail;

a current-limiting element coupling the capacitive element to the first rail; and

a switch controlling a current between the capacitive element and the current-limiting element, the switch having a duty cycle that controls the current and controls the boost voltage V₂.

13. The pulsed DC power supply system of claim 12, wherein the current-limiting element is an inductive element.

14. The pulsed DC power supply system of claim 13, wherein the inductive element is an inductor.

15. A method comprising:

delivering a first bipolar pulsed DC voltage to a first anodeless electrode in a plasma processing chamber;

delivering a second pulsed DC voltage to a second anodeless electrode in the plasma processing chamber,

the first pulsed DC voltage having a boosted voltage V₁+V₂ magnitude for a first portion of each pulse of the first pulsed DC voltage,

the second pulsed DC voltage having a boosted voltage V₁+V_2′

magnitude for a first portion of each pulse of the second pulsed DC voltage,

each DC pulse in the first and second pulsed DC voltages having an opposite polarity to a previous pulse.

16. The method of claim 15, wherein control of a process voltage V₁ is independent of control over a first boost voltage V₂ and a second boost voltage V_2′

, and wherein control over the first boost voltage V₂ is independent of control over the second boost voltage V_2′

.

17. The method of claim 15, wherein the first and second anodeless electrodes are adjacent to each other.

18. The method of claim 15, wherein the first and second anodeless electrodes are spaced from each other by at least one other anodeless electrode.

19. A pulsed DC power supply system comprising:

two or more pulsed DC power supply systems each configured to provide pulsed DC voltage to a different anodeless electrode within a plasma processing chamber,

each pulsed DC voltage having a selectable boost voltage during a first portion of each pulse, and

the selectable boost voltage being different for at least two of the pulsed DC power supply systems.