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Processing system for detecting in-situ arcing events during substrate processing

  • US 9,129,779 B2
  • Filed: 04/06/2012
  • Issued: 09/08/2015
  • Est. Priority Date: 07/07/2008
  • Status: Active Grant
First Claim
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1. A processing system for detecting in-situ arcing events during substrate processing, comprising:

  • at least a plasma processing chamber having a probe arrangement, wherein said probe arrangement is disposed on a surface of said processing chamber and is configured to measure at least one plasma processing parameter, wherein said probe arrangement includesa plasma-facing sensor, anda measuring capacitor, wherein said plasma-facing sensor is coupled to a first plate of said measuring capacitor; and

    a detection arrangement, said detection arrangement is coupled to a second plate of said measuring capacitor, wherein said detection arrangement is configured for converting an induced current flowing through said measuring capacitor into a set of digital signals, said set of digital signals being processed to detect said in-situ arcing events.

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