Liquid precursor for deposition of copper selenide and method of preparing the same
First Claim
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1. A method of preparing a liquid copper selenide precursor, the method comprising:
- reducing elemental selenium with a stoichiometric amount of hydrazine in the presence of a first solvent to yield a first solution comprising Se22−
; and
combining the first solution with a second solution comprising a copper salt and a second solvent to yield the liquid copper selenide precursor comprising soluble CuSe2, wherein the liquid copper selenide precursor is essentially hydrazine-free.
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Abstract
Liquid precursors containing copper and selenium suitable for deposition on a substrate to form thin films suitable for semiconductor applications are disclosed. Methods of preparing such liquid precursors and methods of depositing a precursor on a substrate are also disclosed.
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15 Claims
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1. A method of preparing a liquid copper selenide precursor, the method comprising:
- reducing elemental selenium with a stoichiometric amount of hydrazine in the presence of a first solvent to yield a first solution comprising Se22−
; and
combining the first solution with a second solution comprising a copper salt and a second solvent to yield the liquid copper selenide precursor comprising soluble CuSe2, wherein the liquid copper selenide precursor is essentially hydrazine-free. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
- reducing elemental selenium with a stoichiometric amount of hydrazine in the presence of a first solvent to yield a first solution comprising Se22−
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