Miniaturized feedthrough

• US 9,132,268 B2
• Filed: 11/30/2007
• Issued: 09/15/2015
• Est. Priority Date: 11/30/2006
• Status: Active Grant

• Current Assignee: Medtronic Incorporated (Medtronic Plc)
• Original Assignee: Medtronic Incorporated (Medtronic Plc)
• Inventors: Receveur, Rogier
• Primary Examiner(s): Heller, Tammie K
• Application Number:
  US11/948,673
• Publication Number:
  US 20080140148A1
• Time in Patent Office: 2,846 Days
• Field of Search: 607/36, 607/37, 600/300, 422/58, 361/313, 361/302, 439/909, 257/698, 174650-665
• US Class Current: 1/1
• CPC Class Codes: A61N 1/05 for implantation or insertion into the body, e.g. heart electrode A61N1/06 takes precedence
• CPC Class Codes: A61N 1/3754 Feedthroughs

Abstract

Formation of a feedthrough in a substrate for use in an implantable medical device is presented. A substrate includes a first surface and a second surface, and a via that extends through the first and the second surfaces. A dielectric layer is formed over one of a first surface of the substrate. Conductive material is introduced into the via to form a feedthrough.

Claims

1. An implantable medical device (IMD) comprising:

a semiconductor substrate that includes a first surface and a second surface, and a via that extends through the first and the second surfaces, wherein the via comprises;

a first portion extending from the first surface into the substrate, and

a second portion extending from the second surface into the substrate to the first portion, wherein the width of the first portion is greater than the width of the second portion;

a dielectric layer formed over the first surface of the substrate and an interior surface of the first portion of the via; and

conductive material located within the second portion of the via and terminating at a junction between the first and second portions, wherein the junction is located between the first surface and the second surface, wherein the conductive material forms a feedthrough in the second portion of the via.

2. The IMD of claim 1 wherein the conductive material being one of tantalum (Ta), niobium (Nb), titanium (Ti), platinum (Pt), gold (Au), and alloys thereof.

3. The IMD of claim 1 wherein the first portion of the via includes a first inner diameter at the first surface and the second portion of the via includes a second inner diameter at the second surface, wherein the second inner diameter is smaller than the first inner diameter.

4. The IMD of claim 3, wherein the smaller second inner diameter reduces an aspect ratio of the via.

5. A method for forming a feedthrough for an implantable medical device comprising:

providing a semiconductor substrate with a first surface and a second surface, the substrate includes a via that extends through the first and the second surfaces, wherein the via comprises;

a first portion extending from the first surface into the substrate, and

a second portion extending from the second surface into the substrate to the first portion, wherein the width of the first portion is greater than the width of the second portion;

introducing a dielectric layer on the first surface of the substrate and an interior surface of the first portion of the via; and

introducing conductive material into the second portion of the via to form a feedthrough, wherein the conductive material in the second portion of the via terminates at a junction between the first and second portions, wherein the junction is located between the first surface and the second surface.

6. The method of claim 5 wherein the semiconductor substrate is a sensor substrate.

7. The method of claim 5 further comprising:

coupling a base to the second surface of the substrate with dielectric material disposed between the second surface of the substrate and the base.

8. The method of claim 7 further comprising:

removing the base and dielectric material from the second surface of the substrate.

9. The method of claim 5 wherein the conductive material being one of Nb, Ti, Pt, Au, and alloys thereof.

10. A method for forming a feedthrough associated with an implantable medical device, the method comprising:

providing a semiconductor substrate which includes a first surface and a second surface;

creating a first via in the substrate, wherein the first via extends into the substrate from the first surface;

creating a second via in the substrate, the second via in communication with the first via, wherein the second via extends into the substrate from the second surface, wherein the width of the first via is greater than the width of the second via; and

forming a feedthrough in the second via by introducing conductive material into the second via, wherein the conductive material terminates at a junction between the first and second vias, wherein the junction is located between the first surface and the second surface.

11. The method of claim 10, wherein the conductive material being one of Ta, Nb, Ti, Pt, Au, and alloys thereof.

12. The method of claim 10, wherein the method further comprises forming a dielectric layer on the first surface and an interior surface of the first via.

13. The method of claim 12, wherein the method further comprises forming a conductive layer on the dielectric layer, wherein the conductive material is electrically coupled to the conductive layer.

14. The method of claim 13, wherein the method further comprises forming conductive metal in the conductive layer within the first via.

15. The method of claim 10, wherein creating the first via comprises forming a trench in the first surface of the substrate.

16. The method of claim 15, wherein the method further comprises locating a metal pin in the trench to electrically couple the metal pin to the conductive material.

17. The method of claim 10, wherein the height of the first via is greater than the height of the second via.

18. The method of claim 10, wherein the method further comprises forming one or more layers on the second surface of the substrate, wherein the one or more layers comprise at least one hermetically-seated electronic device.

19. An implantable medical device (MD) comprising:

a semiconductor substrate comprising a first surface and a second surface;

a first aperture extending from the first surface into the substrate;

a second aperture extending from the second surface into the substrate to the first aperture, wherein the width of the first aperture is greater than the width of the second aperture;

a dielectric layer on the first surface and an interior surface of the first aperture;

a conductive layer on the dielectric layer; and

a feedthrough comprising conductive material within the second aperture, wherein the conductive material terminates at a junction between the first and second apertures, wherein the junction is located between the first surface and the second surface wherein the conductive material in the second aperture is electrically coupled to the conductive layer.

20. The IMD of claim 19, wherein the first aperture comprises a trench.

21. The IMD of claim 20, wherein a metal pin is located in the trench.

22. The IMD of claim 19, wherein conductive metal is located within the first aperture on the conductive layer, wherein the conductive metal is electrically coupled to the conductive layer.

23. The IMD of claim 19, wherein the height of the first aperture is greater than the height of the second aperture.

24. The IMD of claim 19, wherein the IMD further comprises one or more layers on the second surface forming at least one hermetically-sealed electronic device.

25. An implantable medical device (IMD) comprising:

a semiconductor substrate that includes a first surface and a second surface, and a via that extends through the first and the second surfaces, wherein the via comprises;

a first portion extending from the first surface into the substrate, and

a second portion extending from the second surface into the substrate to the first portion, wherein the width of the first portion is greater than the width of the second portion;

a dielectric layer formed directly onto the first surface of the substrate and an interior surface of the first portion of the via; and

conductive material located within the second portion of the via and terminating at a junction between the first and second portions, wherein the junction is located between the first surface and the second surface, wherein the conductive material forms a feed through in the second portion of the via.