Lithographic apparatus and device manufacturing method

• US 9,134,630 B2
• Filed: 02/02/2011
• Issued: 09/15/2015
• Est. Priority Date: 02/09/2010
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Zwet, Erwin John, De Jager, Pieter Willem Herman, Onvlee, Johannes, Fritz, Erik Christiaan
• Primary Examiner(s): KREUTZER, COLIN WRIGHT
• Application Number:
  US13/577,560
• Publication Number:
  US 20120307222A1
• Time in Patent Office: 1,686 Days
• Field of Search: 355/46, 355/67, 355/77
• US Class Current: 1/1
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70366 Rotary scanning
• CPC Class Codes: G03F 7/70391 Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
• CPC Class Codes: G03F 7/704 Scanned exposure beam, e.g. raster-, rotary- and vector scanning mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358
• CPC Class Codes: G03F 7/70491 Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
• CPC Class Codes: G03F 7/70883 of optical system

Abstract

A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.

Claims

1. A lithographic apparatus comprising:

an optical column capable of projecting a beam on a target portion of a substrate, the optical column having;

a self emissive contrast device configured to emit the beam, and

a projection system configured to project the beam onto the target portion,

the projection system comprising an optical element;

an actuator to move at least part of the optical column including the optical element with respect to the substrate;

a surface facing a radiation receiving or transmitting surface of the optical element and with respect to which the radiation receiving or transmitting surface of the optical element is movable, the surface being within about 2 cm from the radiation receiving or transmitting surface of the optical element; and

a control system configured to cause the self emissive contrast device to modulate emission of the beam during projection and to cause the actuator to move the optical element during projection with respect to the surface.

2. The apparatus according to claim 1, comprising a compartment around the moving part of the optical column, the surface being part of the compartment.

3. The apparatus according to claim 2, wherein the compartment is substantially gas tight.

4. The apparatus according to claim 2, wherein the optical element comprises a lens, the compartment comprises a window, the beam traverses through the lens and the window, and the distance between the lens and the window is smaller than 2 cm.

5. The apparatus according to claim 1, wherein the optical column comprises a stationary part, and the self emissive contrast device is provided to the stationary part.

6. The apparatus according to claim 1, wherein the actuator is a rotary motor and the movement of the moving part is a rotational movement.

7. The apparatus according to claim 6, wherein the rotational movement is more than 500 RPM.

8. The apparatus according to claim 1, wherein the projection system comprises a first optical group and a second optical group, the first optical group forms a first wheel shape portion of the projection system and the second optical group forms a second wheel shape portion of the projection system.

9. The apparatus according to claim 1, wherein the self emissive contrast device comprises a laser diode.

10. A device manufacturing method comprising:

emitting a beam with a self emissive contrast device;

projecting the beam onto a target portion of a substrate using a projection system, the projection system comprising an optical element;

causing the self emissive contrast device to modulate emission of the beam during projection; and

during projection, moving the optical element with respect to the substrate and with respect to a surface facing a radiation receiving or transmitting surface of the optical element, the surface being within about 2 cm from the radiation receiving or transmitting surface of the optical element.

11. The method according to claim 10, wherein moving the optical element comprises rotating the optical element.

12. The method according to claim 10, wherein a compartment is around the optical element, the surface being part of the compartment.

13. The method according to claim 12, wherein the compartment is substantially gas tight.

14. The method according to claim 12, wherein the optical element comprises a lens, the compartment comprises a window, the beam traverses through the lens and the window, and the distance between the lens and the window is smaller than 2 cm.

15. A lithographic apparatus comprising:

a self emissive contrast device configured to emit a beam;

a projection system configured to project the beam onto a target surface of a substrate, the projection system comprising an optical element;

a substantially gas-tight compartment enclosing at least the optical element, wherein the self emissive contrast device and the substrate are outside the compartment;

an actuator to move the optical element with respect to the substrate; and

a control system configured to cause the self emissive contrast device to modulate emission of the beam during projection and to cause the actuator to move the optical element during projection with respect to the compartment.

16. The apparatus according to claim 15, further comprising a pump to control the pressure within the compartment to a level below 1 Bar.

17. The apparatus according to claim 15, further comprising a medium supply to provide a medium other than air to the compartment.

18. The apparatus according to claim 17, wherein the medium supply is a helium supply to supply helium to the compartment.

19. The apparatus according to claim 15, wherein at least part of the actuator to move the optical element extends through a wall of the compartment.

20. A lithographic apparatus comprising:

a table to support a substrate;

a self emissive contrast device configured to emit a beam;

a projection system configured to project the beam onto a target portion of the substrate, the projection system comprising an optical element mounted on a movable frame;

an actuator to move the optical element with respect to the substrate;

a control system configured to cause the self emissive contrast device to modulate emission of the beam during projection and to cause the actuator to move the optical element during projection; and

a covering displaced from the table, the covering having a generally U shape into which at least the optical element extends, at least part of the frame being outside of the U shape of the covering and arranged to cause the optical element to laterally move within or through the U shape.