CMP pad dresser having leveled tips and associated methods

• US 9,138,862 B2
• Filed: 03/13/2013
• Issued: 09/22/2015
• Est. Priority Date: 05/23/2011
• Status: Active Grant

• Current Assignee: Chien-Min Sung
• Original Assignee: Kinik Company
• Inventors: Sung, Chien-Min
• Primary Examiner(s): NGUYEN, GEORGE BINH MINH
• Application Number:
  US13/802,112
• Publication Number:
  US 20140099868A1
• Time in Patent Office: 923 Days
• Field of Search: 451/443, 451/444, 451/548, 451/56, 512/95, 513/09
• US Class Current: 1/1
• CPC Class Codes: B24B 37/044 characterised by the composition of the lapping agent
• CPC Class Codes: B24B 53/017 Devices or means for dressing, cleaning or otherwise conditioning lapping tools
• CPC Class Codes: H01L 21/31055 the removal being a chemical etching step, e.g. dry etching etching per se H01L21/311
• CPC Class Codes: H01L 21/3212 by chemical mechanical polishing [CMP]

Abstract

CMP pad dressers having leveled tips and associated methods are provided. In one aspect, for example, a method can include pressing a CMP pad dresser against a CMP pad, where the dresser includes a monolayer of a plurality of superabrasive particles protruding from a matrix layer. The difference in protrusion distance between the highest protruding tip and the second highest protruding tip of the monolayer of superabrasive particles is less than or equal to about 10 microns and the difference in protrusion distance between the highest 10 protruding tips of the monolayer of superabrasive particles are within about 20 microns or less. The method can further include rotating the dresser against the CMP pad such that asperities are cut into the CMP pad having a maximum cutting depth of about 60 microns.

Claims

1. A method of conditioning a CMP pad, comprising:

pressing a CMP pad dresser against a CMP pad, the dresser including a monolayer of a plurality of superabrasive particles protruding from a matrix layer, wherein the difference in protrusion distance between the highest protruding tip and the second highest protruding tip of the monolayer of superabrasive particles is less than or equal to about 10 microns and the difference in protrusion distance between the highest 10 protruding tips of the monolayer of superabrasive particles are within about 20 microns or less; and

rotating the dresser against the CMP pad such that asperities are cut into the CMP pad having a maximum cutting depth of about 60 microns.

2. The method of claim 1, wherein at least 100 tips of the plurality of superabrasive particles cut asperities into the CMP pad as the dresser is rotated.

3. The method of claim 1, wherein at least 50 tips of the plurality of superabrasive particles cut asperities into the CMP pad as the dresser is rotated.

4. The method of claim 1, wherein at least 25 tips of the plurality of superabrasive particles cut asperities into the CMP pad as the dresser is rotated.

5. The method of claim 1, wherein substantially all of the asperities are cut in the CMP pad by superabrasive particles located at a peripheral location of the dresser.

6. The method of claim 5, wherein the peripheral location extends from an outer edge of the dresser inwardly toward a center point of the dresser for up to about 90% of the dresser radius.

7. The method of claim 5, wherein the peripheral location extends from an outer edge of the dresser inwardly toward a center point of the dresser for up to about 50% of the dresser radius.

8. The method of claim 5, wherein the peripheral location extends from an outer edge of the dresser inwardly toward a center point of the dresser for up to about 33% of the dresser radius.

9. The method of claim 1, wherein substantially all of the superabrasive particles are located at a peripheral location of the dresser.

10. The method of claim 1, wherein substantially all of the superabrasive particles are arranged in uniform predetermined pattern at a peripheral location of the dresser.

11. The method of claim 1, further comprising:

rotating the CMP pad;

applying a slurry to a polishing surface of the rotating CMP pad;

applying a workpiece to the polishing surface such that the workpiece is polished by the asperities in combination with the slurry.

12. The method of claim 11, wherein the workpiece is a semiconductor device.

13. The method of claim 12, wherein the semiconductor device includes one or more layers of Cu, W, an oxide layer, or a combination thereof.

14. The method of claim 12, wherein the semiconductor device has a node size of less than or equal to 28 nm.

15. The method of claim 12, wherein the semiconductor device has a line width of less than or equal to about 30 nm.

16. The method of claim 12, wherein the semiconductor device is a wafer having a size greater than 400 mm.

17. The method of claim 11, wherein the slurry includes an abrasive selected from the group consisting of silica, alumina, ceria, and combinations thereof.

18. The method of claim 11, wherein the slurry includes an oxidative compound.

19. The method of claim 17, wherein the oxidative compound is hydrogen peroxide.

20. The method of claim 11, wherein the CMP pad is polyurethane.