Illumination optical apparatus and projection exposure apparatus

• US 9,140,992 B2
• Filed: 04/26/2006
• Issued: 09/22/2015
• Est. Priority Date: 10/28/2003
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shiraishi, Naomasa
• Primary Examiner(s): Ton, Toan
• Assistant Examiner(s): RIDDLE, CHRISTINA A
• Application Number:
  US11/410,952
• Publication Number:
  US 20060203214A1
• Time in Patent Office: 3,436 Days
• Field of Search: 355 67- 71, 355/53, 355/52, 355/55, 355/77, 356/365, 359/494, 359497-500, 250/492.1, 250/492.2, 250/492.22, 250/548, 430/5, 430/8, 430/22, 430/30, 430/311, 430/312
• US Class Current: 1/1
• CPC Class Codes: G02B 27/28 for polarising used in stereoscopes G02B30/25
• CPC Class Codes: G02B 27/286 for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another G02B5/3083 takes precedence; light guide coupling means utilising polarising elements G02B6/34
• CPC Class Codes: G02B 5/3083 Birefringent or phase retarding elements G02B5/3008, G02B5/3016 take precedence; systems for polarisation control G02B27/286; manufacturing phase modulating patterns by lithographic processes G03F7/001
• CPC Class Codes: G03F 7/70108 Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70566 Polarisation control
• CPC Class Codes: G03F 7/70966 Birefringence

Abstract

An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system for illuminating a reticle with an illumination light and a projection optical system for projecting the pattern image of the reticle onto a wafer are provided. An illumination light emitted from an exposure light source in a linearly polarized state in the illumination optical system passes through first and second birefringent members having different fast axis directions and is converted into a polarized state that is substantially linearly polarized in a circumferential direction with the optical axis as the center in an almost specific annular area, and them illuminates the reticle under an annular illuminating condition after passing through a fly-eye lens.

Claims

1. A projection exposure apparatus which projects an image of a pattern on a first object onto a second object, the projection exposure apparatus comprising:

a projection optical system arranged between the first object and the second object that projects the image of the pattern on the first object onto the second object; and

an illumination optical system that illuminates the first object with illumination light from a light source, and comprising at least two birefringent members arranged along a traveling direction of the illumination light, wherein a direction of a fast axis of an at least one birefringent member of the at least two birefringent members is different from a direction of a fast axis of another birefringent member of the at least two birefringent members,

wherein the at least one birefringent member of the at least two birefringent members has a non-uniform surface; and

the at least one birefringent member changes a polarization state of the illumination light passing the at least one birefringent member to consist primarily of S-polarization when the illumination light reaches the first object after the illumination light entering into the at least one birefringent member passes the at least one birefringent member.

2. The projection exposure apparatus according to claim 1, further comprising a beam limiting member which limits the illumination light incident to the first object, to a plurality of specific, substantially discrete directions.

3. The projection exposure apparatus according to claim 2, wherein the beam limiting member further limits an incidence direction of the illumination light incident to the first object, to a specific illumination beam incident in a specific incidence angle range to the first object.

4. The projection exposure apparatus according to claim 2, wherein the beam limiting member includes a diffractive optical element disposed between the light source and the at least two birefringent members.

5. The projection exposure apparatus according to claim 1, wherein the at least one birefringent member of the at least two birefringent members is a non-uniform wavelength plate in which a polarization phase difference, which is a phase difference given between a linear polarization component parallel to the fast axis and a linear polarization component parallel to a slow axis in transmitted light, nonlinearly varies according to locations in the at least one birefringent member of the at least two birefringent members.

6. The projection exposure apparatus according to claim 5, wherein the non-uniform wavelength plate includes a first non-uniform wavelength plate which gives the polarization phase difference with a 2-fold rotation symmetry about an optical axis of the illumination optical system, to a specific illumination light or to the illumination light distributed in a specific annular region.

7. The projection exposure apparatus according to claim 6, wherein the non-uniform wavelength plate further includes a second non-uniform wavelength plate which gives the polarization phase difference with a 1-fold rotation symmetry about the optical axis of the illumination optical system, to the specific illumination light or to the illumination light distributed in the specific annular region.

8. The projection exposure apparatus according to claim 7, wherein directions of the fast axes of the first and second non-uniform wavelength plates are shifted by 45°

from each other about a rotation center on the optical axis of the illumination optical system.

9. The projection exposure apparatus according to claim 1, further comprising an optical integrator disposed between the at least two birefringent members and the first object.

10. The projection exposure apparatus according to claim 9, further comprising a zoom optical system, a conical prism group or a polyhedron prism group with a variable spacing disposed between the at least two birefringent members and the optical integrator.

11. The projection exposure apparatus according to claim 10, wherein the optical integrator is a fly'"'"'s eye lens.

12. The projection exposure apparatus according to claim 1, further comprising a polarization controlling mechanism disposed between the light source and the at least two birefringent members and arranged to convert a polarization state of the illumination light from the light source.

13. The projection exposure apparatus according to claim 1, further comprising a rotating mechanism which enables rotation of the at least one birefringent member of the at least two birefringent members about an optical axis of the illumination optical system.

14. The projection exposure apparatus according to claim 1, further comprising plural sets of the at least two birefringent members, and a birefringent member replacing mechanism which replaceably places the at least two birefringent members in the plural sets, in the illumination optical system.

15. An exposure method of exposing a photosensitive body as a second object to an image of a pattern on a mask as a first object, the method comprising:

arranging a projection optical system between the first object and the second object that projects the image of the pattern on the first object onto the second object; and

illuminating the first object with illumination light from a light source of an illumination optical system, the illumination optical system comprising at least two birefringent members arranged along a traveling direction of the illumination light, wherein a direction of a fast axis of an at least one birefringent member of the at least two birefringent members is different from a direction of a fast axis of another birefringent member of the at least two birefringent members,

wherein the at least one birefringent member of the at least two birefringent members has a non-uniform surface; and

the at least one birefringent member changes polarization state of the illumination light passing the at least one birefringent member to consist primarily of S-polarization when the illumination light reaching the first object after the illumination light entering the at least one birefringent member passes the at least one birefringent member.

16. A device fabrication method comprising a lithography step of transferring the pattern onto the photosensitive body by the exposure method defined in claim 15.

17. An exposure method of exposing a photosensitive body as a second object to an image of a pattern on a mask as a first object, the method comprising:

arranging a projection optical system between the first object and the second object that projects the image of the pattern on the first object onto the second object;

illuminating the first object with illumination light from a light source of an illumination optical system, the illumination optical system comprising at least two birefringent members arranged along a traveling direction of the illumination light, wherein a direction of a fast axis of an at least one birefringent member of the at least two birefringent members is different from a direction of a fast axis of another birefringent member of the at least two birefringent members,

wherein the at least one birefringent member of the at least two birefringent members has a non-uniform surface; and

the at least one birefringent member changes a polarization state of the illumination light passing the at least one birefringent member to consist primarily of S-polarization when the illumination light reaching the first object after the illumination light entering the at least one birefringent member passes the at least one birefringent member;

limiting the illumination light incident to the first object, to a plurality of specific, substantially discrete directions with a beam limiting member; and

wherein the beam limiting member includes a diffractive optical element disposed between the light source and the at least two birefringent members.

18. A device fabrication method comprising a lithography step of transferring the pattern onto the photosensitive body by the exposure method defined in claim 17.