Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas
First Claim
1. An exposure method for illuminating a pattern with an illumination system to expose a substrate through a projection system, comprising:
- illuminating the pattern with illumination light having a light amount distribution, which is set such that an amount of light on a pupil plane of the illumination system is larger in an on-axis area substantially including an optical axis and in a plurality of off-axis areas arranged away from the optical axis than in an area other than the on-axis area and the plurality of off-axis areas, polarization states of the illumination light in the plurality of off-axis areas on the pupil plane being substantially linear polarization; and
projecting an image of the pattern illuminated with the illumination light onto the substrate by the projection system,wherein the light amount distribution on the pupil plane is generated by a formation optical system arranged in the illumination system and at an incident side of an optical integrator, anda polarization direction of the illumination light which passes through at least one of the plurality of off-axis areas is changed by a polarization setting member so that the polarization direction at any off-axis area on the pupil plane is substantially perpendicular to a radial direction extending from the optical axis to that off-axis area the polarization setting member being arranged in the illumination system and at the incident side of the optical integrator.
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Abstract
An exposure method and apparatus that illuminates a pattern with an illumination system to expose a substrate through a projection system are provided. The pattern is illuminated with illumination light having a light amount distribution, which is set such that an amount of light is larger in an on-axis area substantially including an optical axis and in a plurality of off-axis areas arranged out of the optical axis than in an area other than the on-axis area and the plurality of off-axis areas on a pupil plane of the illumination system. The polarization states of the illumination light are different between the on-axis area and the off-axis areas.
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Citations
42 Claims
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1. An exposure method for illuminating a pattern with an illumination system to expose a substrate through a projection system, comprising:
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illuminating the pattern with illumination light having a light amount distribution, which is set such that an amount of light on a pupil plane of the illumination system is larger in an on-axis area substantially including an optical axis and in a plurality of off-axis areas arranged away from the optical axis than in an area other than the on-axis area and the plurality of off-axis areas, polarization states of the illumination light in the plurality of off-axis areas on the pupil plane being substantially linear polarization; and projecting an image of the pattern illuminated with the illumination light onto the substrate by the projection system, wherein the light amount distribution on the pupil plane is generated by a formation optical system arranged in the illumination system and at an incident side of an optical integrator, and a polarization direction of the illumination light which passes through at least one of the plurality of off-axis areas is changed by a polarization setting member so that the polarization direction at any off-axis area on the pupil plane is substantially perpendicular to a radial direction extending from the optical axis to that off-axis area the polarization setting member being arranged in the illumination system and at the incident side of the optical integrator. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. An exposure apparatus, comprising:
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an illumination system which illuminates a pattern with illumination light; and a projection system which projects an image of the pattern illuminated with the illumination light onto a substrate, wherein the illumination system comprises; an optical integrator arranged in an optical path of the illumination light, a formation optical system which is arranged in the optical path on an incident side of the optical integrator, and which generates a light amount distribution on a pupil plane of the illumination system, in which an amount of light is larger in an on-axis area substantially including an optical axis and in a plurality of off-axis areas arranged away from the optical axis than in an area other than the on-axis area and the plurality of off-axis areas, and a polarization setting member which is arranged in the optical path on the incident side of the optical integrator, and which changes a polarization direction of the illumination light which passes through at least one of the plurality of off-axis areas so that the polarization direction at any off-axis area on the pupil plane is substantially coincident with a circumference direction substantially centered around the optical axis perpendicular to a radial direction extending from the optical axis to that off-axis area, a polarization state of the illumination light in the plurality of off-axis areas being substantially linear polarization. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42)
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Specification