Photomasks and methods for using same
First Claim
1. A photomask suitable for forming a photoresist pattern on an aluminum substrate, the photoresist pattern associated with a surface feature created while anodizing the aluminum substrate, the photomask comprising:
- an exterior corner including a first pre-distortion feature, the first pre-distortion feature configured to reduce an amount of corner erosion caused by a subsequent blasting operation at a corresponding exterior corner of the photoresist pattern, wherein the first pre-distortion feature is used to create a first feature at the exterior corner of the photoresist pattern that compensates for erosion of the exterior corner of the photoresist pattern from a blasting media; and
an interior corner including a second pre-distortion feature, the second pre-distortion feature configured to reduce an amount of corner erosion caused by a subsequent blasting operation at a corresponding interior corner of the photoresist pattern, wherein the second pre-distortion feature is used to create a second feature at the interior corner of the photoresist pattern that compensates for erosion of the interior corner of the photoresist pattern from the blasting media.
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Accused Products
Abstract
Methods and structures for forming anodization layers that protect and cosmetically enhance metal surfaces are described. In some embodiments, methods involve forming an anodization layer on an underlying metal that permits an underlying metal surface to be viewable. In some embodiments, methods involve forming a first anodization layer and an adjacent second anodization layer on an angled surface, the interface between the two anodization layers being regular and uniform. Described are photomasking techniques and tools for providing sharply defined corners on anodized and texturized patterns on metal surfaces. Also described are techniques and tools for providing anodizing resistant components in the manufacture of electronic devices.
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Citations
21 Claims
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1. A photomask suitable for forming a photoresist pattern on an aluminum substrate, the photoresist pattern associated with a surface feature created while anodizing the aluminum substrate, the photomask comprising:
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an exterior corner including a first pre-distortion feature, the first pre-distortion feature configured to reduce an amount of corner erosion caused by a subsequent blasting operation at a corresponding exterior corner of the photoresist pattern, wherein the first pre-distortion feature is used to create a first feature at the exterior corner of the photoresist pattern that compensates for erosion of the exterior corner of the photoresist pattern from a blasting media; and an interior corner including a second pre-distortion feature, the second pre-distortion feature configured to reduce an amount of corner erosion caused by a subsequent blasting operation at a corresponding interior corner of the photoresist pattern, wherein the second pre-distortion feature is used to create a second feature at the interior corner of the photoresist pattern that compensates for erosion of the interior corner of the photoresist pattern from the blasting media. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of forming a pattern on an aluminum substrate, the method comprising:
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forming a patterned photoresist on the aluminum substrate using a photomask comprising an exterior corner with a first pre-distortion feature and an interior corner with a second pre-distortion feature, wherein the first pre-distortion feature is used to create a first feature at a photoresist exterior corner and the second pre-distortion feature is used to create a second feature at a photoresist interior corner; blasting the aluminum substrate with a blasting media to form a blasted surface on portions of the aluminum substrate unprotected by the patterned photoresist, wherein the first feature compensates for erosion of the photoresist exterior corner and the second feature compensates for erosion of the photoresist interior corner; removing the patterned photoresist from the aluminum substrate revealing the pattern with distinct corners on the aluminum substrate; and forming an anodization layer on the aluminum substrate. - View Dependent Claims (13, 14, 15, 16, 17, 18)
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19. A method of forming a pattern on an aluminum substrate, the method comprising:
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forming a patterned photoresist on the aluminum substrate using a photomask comprising an exterior corner having a first pre-distortion feature and an interior corner having a second pre-distortion feature, wherein the first pre-distortion feature is used to form a first feature at a photoresist exterior corner and the second pre-distortion feature is used to form a second feature at a photoresist interior corner; and forming a textured surface on portions of the aluminum substrate unprotected by the photoresist pattern by blasting the aluminum substrate with a blasting media, wherein the first feature compensates for erosion of the photoresist exterior corner and the second feature compensates for erosion of the photoresist interior corner such that the pattern on the aluminum substrate has sharply defined corners. - View Dependent Claims (20, 21)
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Specification