Electrical connector between die pad and z-interconnect for stacked die assemblies
First Claim
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1. A method for forming a connector on a die pad at a wafer level of processing, comprising:
- forming a conformal electrically insulative coating overlying at least a front surface of the wafer, wherein the die pads are exposed by openings in the conformal coating;
forming a channel defining an interconnect die edge and a void within the channel;
forming spots of a curable electrically conductive polymer material after forming the conformal electrically insulative coating, wherein the spots are formed over the die pad and extending over the interconnect die edge and at least partially over the void;
curing the conductive polymer material; and
in a wafer cutting procedure thereafter, severing the spots.
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Abstract
Methods for forming connectors on die pads at a wafer level of processing include forming spots of a curable electrically conductive material over die pads and extending to or over the interconnect die edge; curing the conductive material; and in a wafer cutting procedure thereafter severing the spots. Also, die pad to z-interconnect connectors formed by the methods, and shaped and dimensioned accordingly. Also, stacked die assemblies and stacked die packages containing die prepared according to the methods and having die pad to z-interconnect connectors formed by the methods and shaped and dimensioned accordingly.
254 Citations
19 Claims
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1. A method for forming a connector on a die pad at a wafer level of processing, comprising:
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forming a conformal electrically insulative coating overlying at least a front surface of the wafer, wherein the die pads are exposed by openings in the conformal coating; forming a channel defining an interconnect die edge and a void within the channel; forming spots of a curable electrically conductive polymer material after forming the conformal electrically insulative coating, wherein the spots are formed over the die pad and extending over the interconnect die edge and at least partially over the void; curing the conductive polymer material; and in a wafer cutting procedure thereafter, severing the spots. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method for preparing a die for stacking and electrical connection, comprising:
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performing a first wafer cutting procedure along a first saw street; forming a channel defining an interconnect die edge and an empty space therein; forming spots of a curable electrically conductive polymer material over die pads and extending over an interconnect die edge and at least partially over the empty space; curing the conductive polymer material; and in a second wafer cutting procedure thereafter severing the spots, wherein the second wafer cutting procedure defines a final extent of the spots relative to the interconnect die edge in an assembly of the die. - View Dependent Claims (8, 9, 10, 11, 12, 13)
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14. A method for preparing a die for stacking and electrical connection, comprising:
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forming a channel at a front face of the wafer, the channel having a bottom surface disposed below the front face of the wafer, the channel at least partially defining an interconnect die edge of a die of the wafer and an empty space within the channel; applying a conformal electrically insulative coating over at least the front face of the wafer and along the bottom surface of the channel and the interconnect die edge such that a portion of the channel remains empty; applying electrically conductive spots over a die pad exposed at the front face of the wafer and at least partially over the conformal coating and empty space; and thinning the wafer from a back face thereof up to at least the conformal coating at the bottom surface of the channel while the portion of the channel remains empty. - View Dependent Claims (15, 16, 17, 18, 19)
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Specification