Surface treatment of a semiconductor light emitting device
First Claim
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1. A method comprising:
- roughening a light extracting surface of a semiconductor structure, the semiconductor structure comprising a light emitting layer; and
after the roughening, treating the surface to significantly reduce an amount of light extracted from the light extracting surface by increasing at least one of;
total internal reflection within the semiconductor structure, and absorption at the surface.
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Abstract
A method according to embodiments of the invention includes roughening (FIG. 6) a surface (58) of a semiconductor structure (46-48, FIG. 5). The semiconductor structure includes a light emitting layer (47). The surface (58) is a surface from which light is extracted from the semiconductor structure. After roughening, the roughened surface is treated (FIG. 7) to increase total internal reflection, or absorption at the surface, or to reduce an amount of light extracted from the semiconductor structure through the surface (58).
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19 Claims
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1. A method comprising:
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roughening a light extracting surface of a semiconductor structure, the semiconductor structure comprising a light emitting layer; and after the roughening, treating the surface to significantly reduce an amount of light extracted from the light extracting surface by increasing at least one of;
total internal reflection within the semiconductor structure, and absorption at the surface. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A method comprising:
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roughening a light extracting surface of a semiconductor structure, the semiconductor structure comprising a light emitting layer; and after the roughening, treating the surface to significantly reduce an amount of light extracted from the semiconductor structure through the surface. - View Dependent Claims (8, 9, 10, 11, 18, 19)
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12. A method comprising:
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growing a semiconductor structure on a growth substrate, the semiconductor structure comprising a light emitting layer disposed between an n-type region and a p-type region; removing the growth substrate; roughening a light extracting surface of the semiconductor structure; and treating the roughened surface with plasma, wherein the treating significantly reduces an amount of light extracted from the semiconductor structure through the roughened surface. - View Dependent Claims (13, 14, 15, 16, 17)
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Specification