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Apparatus for coating formation by light reactive deposition

  • US 9,163,308 B2
  • Filed: 07/30/2009
  • Issued: 10/20/2015
  • Est. Priority Date: 10/17/2000
  • Status: Expired due to Fees
First Claim
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1. A coating apparatus comprising:

  • a reactant inlet defining a reactant stream path wherein the opening of the reactant inlet is elongated in one dimension and wherein the reactant inlet has dimensions selected to coat the entire substrate in a single pass;

    a shielding gas duct positioned to form a blanket of inert gases along the sides of the reactant stream path and connected to a shielding gas source;

    a reactant supply system connected to the reactant inlet to supply all reactants to a flow along the reactant stream path as a reactant stream wherein the reactant supply system comprises a reactant source and a source of light absorbing gas;

    a continuous wave laser initiating a light path;

    optical elements, configured to direct the light path to intersect the reactant stream at a reaction zone with a product stream continuing from the reaction zone in a product stream path, wherein the light path is oriented to project along the elongated dimension of the reactant inlet, wherein the product stream comprises particles downstream from the reaction zone and wherein the light absorbing gas and reactants are selected for absorption of laser light by the light absorbing gas to drive a chemical reaction between the reactants in the reaction zone;

    a first substrate positioned in the product stream path and the first substrate receives deposited particles thereon as a fused particle coating, wherein the first substrate is positioned such that the substrate does not intersect with the light path;

    a motor connected to the apparatus such that the motor is configured to translate the first substrate relative to the product stream path to coat the substrate in a single pass; and

    a chamber sealed from the ambient atmosphere and a pump connected to the chamber, wherein the reactant inlet and the first substrate are within the chamber.

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