Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas
First Claim
1. An exposure method for illuminating a pattern with an illumination system to expose a substrate through a projection system, the method comprising:
- illuminating the pattern with illumination light with a light amount distribution in which an amount of light is larger in a pair of first areas and a pair of second areas than in a third area, the third area being an area other than the first and second areas on a pupil plane of the illumination system and surrounding each of the first and second areas, the pair of the first areas being arranged outside an optical axis, the pair of the second areas being arranged outside the pair of the first areas, each center of gravity of the pair of the first areas and each center of gravity of the pair of the second areas being in the same straight line passing through the optical axis, each of the first areas being surrounded by the third area so as to be out of contact with the pair of second areas; and
projecting an image of the pattern illuminated with the illumination light onto the substrate by the projection system.
0 Assignments
0 Petitions
Accused Products
Abstract
An exposure method and apparatus for illuminating a pattern with an illumination system to expose a substrate through a projection system. The pattern is illuminated with illumination light with a light amount distribution in which an amount of light is larger in a pair of first areas and a pair of second areas than in an area other than the first and second areas on a pupil plane of the illumination system. The pair of the first areas being arranged outside an optical axis, the pair of the second areas being arranged on the same straight line as the pair of the first areas are arranged on, and the pair of the second areas being arranged outside the pair of the first areas.
-
Citations
28 Claims
-
1. An exposure method for illuminating a pattern with an illumination system to expose a substrate through a projection system, the method comprising:
-
illuminating the pattern with illumination light with a light amount distribution in which an amount of light is larger in a pair of first areas and a pair of second areas than in a third area, the third area being an area other than the first and second areas on a pupil plane of the illumination system and surrounding each of the first and second areas, the pair of the first areas being arranged outside an optical axis, the pair of the second areas being arranged outside the pair of the first areas, each center of gravity of the pair of the first areas and each center of gravity of the pair of the second areas being in the same straight line passing through the optical axis, each of the first areas being surrounded by the third area so as to be out of contact with the pair of second areas; and projecting an image of the pattern illuminated with the illumination light onto the substrate by the projection system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
-
-
11. An exposure method for illuminating a pattern with an illumination system to expose a substrate through a projection system, the method comprising:
-
illuminating the pattern with illumination light with a light amount distribution in which an amount of light is larger in four areas than in a fifth area, the fifth area being an area other than the four areas on a pupil plane of the illumination system and surrounding each of the four areas, each center of gravity of the four areas being in the same straight line passing through an optical axis, each of the four areas being surrounded by the fifth area so as to be out of contact with a remaining three of the four areas; and projecting an image on the pattern illuminated with the illumination light onto the substrate by the projection system. - View Dependent Claims (12, 13, 14)
-
-
15. An exposure apparatus, comprising:
-
an illumination system which illuminates a pattern; a projection system which projects the pattern onto a substrate; and a formation optical system which can change a light amount distribution of illumination light on a pupil plane of the illumination system and which can generate a light amount distribution in which an amount of light is larger in a pair of first areas and in a pair of second areas than in a third area, the third area being an area other than the pair of the first areas and the pair of the second areas on the pupil plane and surrounding each of the first and second areas, the pair of the first areas being arranged outside an optical axis, the pair of the second areas being arranged outside the pair of the first areas, each center of gravity of the pair of the first areas and each center of gravity of the pair of the second areas being in the same straight line passing through the optical axis, each of the first areas being surrounded by the third area so as to be out of contact with the pair of second areas. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24)
-
-
25. An exposure apparatus, comprising:
-
an illumination system which illuminates a pattern; a projection system which projects the pattern onto a substrate; and a formation optical system which can change a light amount distribution of illumination light on a pupil plane of the illumination system and which can generate a light amount distribution in which an amount of light is larger in four areas than in a fifth area, the fifth area being an area other than the four areas on the pupil plane and surrounding each of the four areas, each center of gravity of the four areas being in the same straight line passing through an optical axis, each of the four areas being surrounded by the fifth area so as to be out of contact with a remaining three of the four areas. - View Dependent Claims (26, 27, 28)
-
Specification