Laser devices having a gallium and nitrogen containing semipolar surface orientation
First Claim
Patent Images
1. A laser device comprising:
- a gallium and nitrogen containing material having a semipolar surface configured on an offcut orientation to one of either a (60-6-1) plane, a (60-61) plane, a (50-5-1) plane, a (50-51) plane, a (40-4-1) plane, (40-41) plane, a (30-3-1) plane, a (30-31) plane, a (20-2-1) plane, a (20-21) plane, a (30-3-2), or a (30-32) plane;
a laser stripe region formed overlying a portion of the semipolar surface, the laser stripe region being characterized by a cavity orientation substantially parallel to a projection of a c-direction, the laser stripe region having a first end and a second end;
a first facet provided on the first end of the laser stripe region;
a second facet provided on the second end of the laser stripe region;
an n-type cladding region overlying the semipolar surface;
an active region comprising at least one active layer overlying the semipolar surface, the active region comprising a quantum well region or a double hetero-structure region; and
a p-type cladding region overlying the semipolar surface;
wherein the laser stripe region is characterized by a width configured to emit a laser beam having a selected ratio of a first polarization state and a second polarization state, the width configured to emit the laser beam operable in a single lateral mode with an internal loss of less than 9 cm−
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Abstract
Laser devices formed on a semipolar surface region of a gallium and nitrogen containing material are disclosed. The laser devices have a laser stripe configured to emit a laser beam having a cross-polarized emission state.
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Citations
34 Claims
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1. A laser device comprising:
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a gallium and nitrogen containing material having a semipolar surface configured on an offcut orientation to one of either a (60-6-1) plane, a (60-61) plane, a (50-5-1) plane, a (50-51) plane, a (40-4-1) plane, (40-41) plane, a (30-3-1) plane, a (30-31) plane, a (20-2-1) plane, a (20-21) plane, a (30-3-2), or a (30-32) plane; a laser stripe region formed overlying a portion of the semipolar surface, the laser stripe region being characterized by a cavity orientation substantially parallel to a projection of a c-direction, the laser stripe region having a first end and a second end; a first facet provided on the first end of the laser stripe region; a second facet provided on the second end of the laser stripe region; an n-type cladding region overlying the semipolar surface; an active region comprising at least one active layer overlying the semipolar surface, the active region comprising a quantum well region or a double hetero-structure region; and a p-type cladding region overlying the semipolar surface; wherein the laser stripe region is characterized by a width configured to emit a laser beam having a selected ratio of a first polarization state and a second polarization state, the width configured to emit the laser beam operable in a single lateral mode with an internal loss of less than 9 cm−
1. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A laser device comprising:
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a gallium and nitrogen containing material having a semipolar surface configured on an offcut orientation to one of either a (30-3-1) plane, a (30-31) plane, a (20-2-1) plane, a (20-21) plane, a (30-3-2), or a (30-32) plane; an array of N single lateral mode laser stripes formed overlying the semipolar surface, wherein; each of the laser stripes is characterized by a cavity orientation substantially parallel to a projection of a c-direction; each of the laser stripes is characterized by a width ranging from about 0.5 μ
m to about 2.5 μ
m;each of the laser stripes is configured to operate in a single lateral mode; each of the laser stripes is configured to emit a laser beam characterized by a first polarization state and a second polarization state, wherein the first polarization state is orthogonal to the second polarization state; and the laser device is configured to emit a plurality of laser beams, each of the plurality of laser beams characterized by a primary polarization state and a secondary polarization state, wherein a power emitted in the second polarization state is at less than 15% of a power emitted in the first polarization state, and the laser device is characterized by an internal loss of less than 9 cm−
1 and a polarization ratio of at least 90% or at least 95% between the power emitted in the first polarization state and the power emitted in the second polarization state. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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22. A laser device comprising:
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a gallium and nitrogen containing material having a semipolar surface configured on an offcut orientation to one of either a (60-6-1) plane, a (60-61) plane, a (50-5-1) plane, a (50-51), a (40-4-1) plane, a (40-41) plane, a (30-3-1) plane, a (30-31) plane, a (20-2-1) plane, a (20-21) plane, a (30-3-2) plane, or a (30-32) plane; a laser stripe region formed overlying a portion of the semipolar surface, the laser stripe region being characterized by a cavity orientation substantially parallel to a projection of a c-direction, the laser stripe region having a first end and a second end; a first facet provided on the first end of the laser stripe region; a second facet provided on the second end of the laser stripe region; an n-type cladding region overlying the semipolar surface; an active region comprising at least one active layer region overlying the n-type cladding region;
the active region comprising a quantum well region or a double hetero-structure region; anda p-type cladding region overlying the active region; a width characterizing the laser stripe region configured to emit a laser beam having a first polarization state and a second polarization state, the first polarization state being orthogonal to the second polarization state and the first polarization state being the primary polarization state, the width configured to emit the laser beam operable in a multi-lateral mode with an internal loss of less than 9 cm−
1; anda polarization ratio of the laser beam characterizing a cross-polarized emission such that at least 1% of an emitted power is in the second polarization state. - View Dependent Claims (23, 24, 25, 26)
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27. A method of manufacturing an optical device, the method comprising:
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providing a gallium and nitrogen containing semipolar member having a crystalline surface region;
the semipolar surface being configured on an offcut orientation to one of either a (60-6-1) plane, a (60-61) plane, a (50-5-1) plane, a (50-51) plane, a (40-4-1) plane, a (40-41) plane, a (30-3-1) plane, a (30-31) plane, a (20-2-1) plane, a (20-21) plane, a (30-3-2) plane, or a (30-32) plane;
the gallium and nitrogen containing member characterized by a dislocation density of less than 107 cm−
2;forming a gallium and nitrogen containing n-type cladding layer overlying the surface region, the n-type cladding layer having a thickness from 300 nm to 6000 nm with an n-type doping level of 1E17 cm−
3 to 6E18 cm−
3;forming an n-side separate confining heterostructure (SCH) waveguiding layer overlying the n-type cladding layer, the n-side SCH waveguide layer comprising gallium, indium, and nitrogen with a molar fraction of InN of between 1% and 12% and having a thickness from 20 nm to 150 nm; forming an active region overlying the n-side SCH waveguiding layer, the active region comprising at least two quantum wells, the at least two quantum wells comprising InGaN with a thickness of about 2 nm to about 8 nm;
the at least two quantum wells separated by barrier regions, the barrier regions comprising gallium and nitrogen with a thickness of about 2.5 nm to about 25 nm;forming a p-type gallium and nitrogen containing cladding layer overlying the active region, the p-type cladding layer having a thickness from 300 nm to 1000 nm with a p-type doping level of 1E17 cm−
3 to 5E19 cm−
3;forming a p++ gallium and nitrogen containing contact layer overlying the p-type cladding layer, the p++ gallium and nitrogen containing contact layer having a thickness from 10 nm to 120 nm with a p-type doping level of 1E19 cm−
3 to 1E22 cm3; andforming a waveguide member overlying the p++ gallium and nitrogen contact layer, the waveguide member aligned substantially in the projection of a c-direction, the waveguide member comprising a first end and a second end, the first end having a first facet and the second end having a second facet, the waveguide member being characterized by a width configured to emit a laser beam having a selected ratio of a first polarization state and a second polarization state, the width configured to emit the laser beam operable in a single lateral mode for an internal loss of less than 9 cm−
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28. A laser device comprising:
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a gallium and nitrogen containing material having a semipolar surface configured on an offcut orientation to one of either a (60-6-1) plane, a (60-61) plane, a (50-5-1) plane, a (50-51) plane, a (40-4-1) plane, (40-41) plane, a (30-3-1) plane, a (30-31) plane, a (20-2-1) plane, a (20-21) plane, a (30-3-2), or a (30-32) plane; a laser stripe region formed overlying a portion of the semipolar surface, the laser stripe region being characterized by a cavity orientation substantially parallel to a projection of a c-direction, the laser stripe region having a first end and a second end; a first etched facet provided on the first end of the laser stripe region; a second etched facet provided on the second end of the laser stripe region; an n-type cladding region overlying the semipolar surface; an active region comprising at least one active layer overlying the semipolar surface, the active region comprising a quantum well region or a double hetero-structure region; and a p-type cladding region overlying the semipolar surface; wherein the laser stripe region is characterized by a width configured to emit a laser beam having a selected ratio of a first polarization state and a second polarization state, the width configured to emit the laser beam operable in a single lateral mode with an internal loss of less than 9 cm−
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29. A laser device comprising:
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a gallium and nitrogen containing material having a semipolar surface configured on an offcut orientation to one of either a (60-6-1) plane, a (60-61) plane, a (50-5-1) plane, a (50-51), a (40-4-1) plane, a (40-41) plane, a (30-3-1) plane, a (30-31) plane, a (20-2-1) plane, a (20-21) plane, a (30-3-2) plane, or a (30-32) plane; a laser stripe region formed overlying a portion of the semipolar surface, the laser stripe region being characterized by a cavity orientation substantially parallel to a projection of a c-direction, the laser stripe region having a first end and a second end; a first etched facet provided on the first end of the laser stripe region; a second etched facet provided on the second end of the laser stripe region; an n-type cladding region overlying the semipolar surface; an active region comprising at least one active layer region overlying the n-type cladding region;
the active region comprising a quantum well region or a double hetero-structure region; anda p-type cladding region overlying the active region; a width characterizing the laser stripe region configured to emit a laser beam having a first polarization state and a second polarization state, the first polarization state being orthogonal to the second polarization state and the first polarization state being the primary polarization state, the width configured to emit the laser beam operable in a multi-lateral mode with an internal loss of less than 9 cm−
1; anda polarization ratio of the laser beam characterizing a cross-polarized emission such that at least 1% of an emitted power is in the second polarization state.
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30. A method of using a laser device, the method comprising:
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providing the laser device, the laser device comprising; a gallium and nitrogen containing material having a semipolar surface configured on an offcut orientation to one of either a (60-6-1) plane, a (60-61) plane, a (50-5-1) plane, a (50-51) plane, a (40-4-1) plane, (40-41) plane, a (30-3-1) plane, a (30-31) plane, a (20-2-1) plane, a (20-21) plane, a (30-3-2), or a (30-32) plane; a laser stripe region formed overlying a portion of the semipolar surface, the laser stripe region being characterized by a cavity orientation substantially parallel to a projection of a c-direction, the laser stripe region having a first end and a second end; a first facet provided on the first end of the laser stripe region; a second facet provided on the second end of the laser stripe region; an n-type cladding region overlying the semipolar surface; an active region comprising at least one active layer overlying the semipolar surface, the active region comprising a quantum well region or a double hetero-structure region; and a p-type cladding region overlying the semipolar surface; emitting a laser beam from the laser stripe region, wherein the laser stripe region is characterized by a width configured to emit a laser beam having a selected ratio of a first polarization state and a second polarization state, the width configured to emit the laser beam operable in a single lateral mode with an internal loss of less than 9 cm−
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31. A method of using a laser device, the method comprising:
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providing the laser device, the laser device comprising; a gallium and nitrogen containing material having a semipolar surface configured on an offcut orientation to one of either a (30-3-1) plane, a (30-31) plane, a (20-2-1) plane, a (20-21) plane, a (30-3-2), or a (30-32) plane; an array of N single lateral mode laser stripes formed overlying the semipolar surface, wherein; each of the laser stripes is characterized by a cavity orientation substantially parallel to a projection of a c-direction; each of the laser stripes is characterized by a width ranging from about 0.5 μ
m to about 2.5 μ
m;each of the laser stripes is configured to operate in a single lateral mode; each of the laser stripes is configured to emit a laser beam characterized by a first polarization state and a second polarization state, wherein the first polarization state is orthogonal to the second polarization state; and emitting a plurality of laser beams from the laser device, each of the plurality of laser beams characterized by a primary polarization state and a secondary polarization state, wherein a power emitted in the second polarization state is at less than 15% of a power emitted in the first polarization state, and the laser device is characterized by an internal loss of less than 9 cm−
1 and a polarization ratio of at least 90% or at least 95% between the power emitted in the first polarization state and the power emitted in the second polarization state.
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32. A method of using a laser device, the method comprising:
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providing the laser device, the laser device comprising; a gallium and nitrogen containing material having a semipolar surface configured on an offcut orientation to one of either a (60-6-1) plane, a (60-61) plane, a (50-5-1) plane, a (50-51), a (40-4-1) plane, a (40-41) plane, a (30-3-1) plane, a (30-31) plane, a (20-2-1) plane, a (20-21) plane, a (30-3-2) plane, or a (30-32) plane; a laser stripe region formed overlying a portion of the semipolar surface, the laser stripe region being characterized by a cavity orientation substantially parallel to a projection of a c-direction, the laser stripe region having a first end and a second end; a first facet provided on the first end of the laser stripe region; a second facet provided on the second end of the laser stripe region; an n-type cladding region overlying the semipolar surface; an active region comprising at least one active layer region overlying the n-type cladding region;
the active region comprising a quantum well region or a double hetero-structure region; anda p-type cladding region overlying the active region; emitting a laser beam from the laser stripe region, a width characterizing the laser stripe region, the laser beam having a first polarization state and a second polarization state, the first polarization state being orthogonal to the second polarization state and the first polarization state being the primary polarization state, the width configured to emit the laser beam operable in a multi-lateral mode with an internal loss of less than 9 cm−
1; and
a polarization ratio of the laser beam characterizing a cross-polarized emission such that at least 1% of an emitted power is in the second polarization state.
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33. A method of using a laser device, the method comprising:
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providing the laser device, the laser device comprising; a gallium and nitrogen containing material having a semipolar surface configured on an offcut orientation to one of either a (60-6-1) plane, a (60-61) plane, a (50-5-1) plane, a (50-51) plane, a (40-4-1) plane, (40-41) plane, a (30-3-1) plane, a (30-31) plane, a (20-2-1) plane, a (20-21) plane, a (30-3-2), or a (30-32) plane; a laser stripe region formed overlying a portion of the semipolar surface, the laser stripe region being characterized by a cavity orientation substantially parallel to a projection of a c-direction, the laser stripe region having a first end and a second end; a first etched facet provided on the first end of the laser stripe region; a second etched facet provided on the second end of the laser stripe region; an n-type cladding region overlying the semipolar surface; an active region comprising at least one active layer overlying the semipolar surface, the active region comprising a quantum well region or a double hetero-structure region; and a p-type cladding region overlying the semipolar surface; emitting a laser beam from the laser stripe region, wherein the laser stripe region is characterized by a width configured to emit a laser beam having a selected ratio of a first polarization state and a second polarization state, the width configured to emit the laser beam operable in a single lateral mode with an internal loss of less than 9 cm−
1.
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34. A method of using a laser device, the method comprising:
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providing the laser device, the laser device comprising; a gallium and nitrogen containing material having a semipolar surface configured on an offcut orientation to one of either a (60-6-1) plane, a (60-61) plane, a (50-5-1) plane, a (50-51), a (40-4-1) plane, a (40-41) plane, a (30-3-1) plane, a (30-31) plane, a (20-2-1) plane, a (20-21) plane, a (30-3-2) plane, or a (30-32) plane; a laser stripe region formed overlying a portion of the semipolar surface, the laser stripe region being characterized by a cavity orientation substantially parallel to a projection of a c-direction, the laser stripe region having a first end and a second end; a first etched facet provided on the first end of the laser stripe region; a second etched facet provided on the second end of the laser stripe region; an n-type cladding region overlying the semipolar surface; an active region comprising at least one active layer region overlying the n-type cladding region;
the active region comprising a quantum well region or a double hetero-structure region; anda p-type cladding region overlying the active region; emitting a laser beam from the laser stripe region, wherein the laser stripe region is characterized by a width configured to emit a laser beam having a first polarization state and a second polarization state, the first polarization state being orthogonal to the second polarization state and the first polarization state being the primary polarization state, the width configured to emit the laser beam operable in a multi-lateral mode with an internal loss of less than 9 cm−
1; and
a polarization ratio of the laser beam characterizing a cross-polarized emission such that at least 1% of an emitted power is in the second polarization state.
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Specification