Solid state nanopore devices for nanopore applications to improve the nanopore sensitivity and methods of manufacture

• US 9,168,717 B2
• Filed: 09/11/2013
• Issued: 10/27/2015
• Est. Priority Date: 08/26/2013
• Status: Expired due to Fees

• Current Assignee: GlobalFoundries, Inc.
• Original Assignee: GLOBALFOUNDRIES U.S. 2 LLC (GlobalFoundries, Inc.)
• Inventors: Astier, Yann, Bai, Jingwei, Papa Rao, Satyavolu, Reuter, Kathleen, Smith, Joshua T.
• Primary Examiner(s): Vonch, Jeff
• Application Number:
  US14/024,165
• Publication Number:
  US 20150056407A1
• Time in Patent Office: 776 Days
• Field of Search: None
• US Class Current: 1/1
• CPC Class Codes: B32B 2250/03 3 layers
• CPC Class Codes: B32B 2307/204 Di-electric
• CPC Class Codes: B32B 2457/00 Electrical equipment
• CPC Class Codes: B32B 3/266 characterised by an apertured layer, the apertures going through the whole thickness of the layer, e.g. expanded metal, perforated layer, slit layer regular cells B32B3/12
• CPC Class Codes: B81B 1/004 Through-holes, i.e. extending from one face to the other face of the wafer
• CPC Class Codes: B81B 2201/0214 Biosensors; Chemical sensors
• CPC Class Codes: B81B 2203/0127 Diaphragms, i.e. structures separating two media that can control the passage from one medium to another; Membranes, i.e. diaphragms with filtering function
• CPC Class Codes: B81B 2203/0353 Holes
• CPC Class Codes: B81C 1/00087 Holes
• CPC Class Codes: G01N 27/4145 specially adapted for biomolecules, e.g. gate electrode with immobilised receptors
• CPC Class Codes: G01N 27/4146 involving nanosized elements, e.g. nanotubes, nanowires
• CPC Class Codes: G01N 33/48721 Investigating individual macromolecules, e.g. by translocation through nanopores Coulter counters in general G01N15/12; fabrication methods for nanoscale apertures B81B1/00; sequencing of nucleic acids C12Q1/68
• CPC Class Codes: Y10T 428/24322 Composite web or sheet

Abstract

Solid state nanopore devices for nanopore applications and methods of manufacture are disclosed herein. The method includes forming a membrane layer on an underlying substrate. The method further includes forming a hole in the membrane layer. The method further comprises plugging the hole with a sacrificial material. The method further includes forming a membrane over the sacrificial material. The method further includes removing the sacrificial material within the hole and portions of the underlying substrate. The method further includes drilling an opening in the membrane, aligned with the hole.

Claims

1. A nanopore structure, comprising:

a dielectric layer on an underlying substrate;

a first hole in the underlying substrate;

a second hole in the dielectric layer;

a membrane over the dielectric layer, the membrane having an opening suspended and aligned with the hole; and

an air gap, between the membrane and the dielectric layer wherein;

the opening has a smaller diameter than the second hole;

the second hole has a smaller diameter than the air gap;

the air gap has a smaller diameter than the first hole; and

an oxide material between the dielectric layer and the membrane, the oxide material containing the air gap.

2. The structure of claim 1, further comprising a functional electrode used as a mask to achieve a hole diameter of 1 nm to 5 nm.

3. The structure of claim 1, further comprising an electrode formed above the membrane, wherein the electrode is positioned on both sides of the opening and the opening has a constant width.