Charged particle beam apparatus
First Claim
1. A charged particle beam apparatus comprising:
- an electron optical system that focuses electron beams and irradiates a specimen with the electron beams;
a detector that detects secondary electrons or reflected electrons generated from the specimen due to irradiation with the electron beams; and
an image processing unit that compares a plurality of images with each other so as to detect a defect,wherein the electron optical system irradiates the same portion of the specimen with the electron beams at a plurality of accelerating voltages, andwherein the image processing unit differentiates a grain from a void on the basis of a contrast change amount of the same portion in a plurality of images which are acquired so as to respectively correspond to the plurality of accelerating voltages.
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Accused Products
Abstract
The present invention relates to a defect inspection apparatus based on the fact that contrasts of a grain and a void of a semiconductor copper interconnect in a scanning electron microscope are changed depending on electron beam irradiation accelerating voltages. A charged particle beam apparatus of the present invention irradiates the same portion of a specimen with electron beams at a plurality of accelerating voltages, and differentiates a grain (65, 66) from a void (67) on the basis of a contrast change amount of the same portion in a plurality of images (61, 62) acquired so as to respectively correspond to the plurality of accelerating voltages. Consequently, it is possible to automatically detect a grain and a void in a differentiation manner at a high speed without destructing a specimen.
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Citations
6 Claims
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1. A charged particle beam apparatus comprising:
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an electron optical system that focuses electron beams and irradiates a specimen with the electron beams; a detector that detects secondary electrons or reflected electrons generated from the specimen due to irradiation with the electron beams; and an image processing unit that compares a plurality of images with each other so as to detect a defect, wherein the electron optical system irradiates the same portion of the specimen with the electron beams at a plurality of accelerating voltages, and wherein the image processing unit differentiates a grain from a void on the basis of a contrast change amount of the same portion in a plurality of images which are acquired so as to respectively correspond to the plurality of accelerating voltages. - View Dependent Claims (2, 3)
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4. A charged particle beam apparatus comprising:
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an electron optical system that focuses electron beams and irradiates a specimen with the electron beams; a detector that detects secondary electrons or reflected electrons generated from the specimen due to irradiation with the electron beams; and an image processing unit that compares a plurality of images with each other so as to detect a defect, wherein the electron optical system irradiates the same portion of the specimen with the electron beams at a plurality of accelerating voltages, and wherein the image processing unit identifies a void located at a depth designated in advance from a surface of the specimen on the basis of a contrast change amount of the same portion in a plurality of images which are acquired so as to respectively correspond to the plurality of accelerating voltages. - View Dependent Claims (5, 6)
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Specification