Substrate placement in immersion lithography

• US 9,182,222 B2
• Filed: 11/08/2012
• Issued: 11/10/2015
• Est. Priority Date: 12/10/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Hoogendam, Christiaan Alexander, Nijmeijer, Gerrit Johannes, Cuperus, Minne, Van Eijck, Petrus Anton Willem Cornelia Maria
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US13/672,539
• Publication Number:
  US 20130182231A1
• Time in Patent Office: 1,097 Days
• Field of Search: 355/30, 355/53, 355/72, 355/55
• US Class Current: 1/1
• CPC Class Codes: G01B 11/14 for measuring distance or clearance between spaced objects or spaced apertures G01B11/26 takes precedence; rangefinders G01C3/00
• CPC Class Codes: G01B 11/26 for measuring angles or tapers; for testing the alignment of axes
• CPC Class Codes: G01B 11/272 using photoelectric detection means
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 9/7011 Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder

Abstract

A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.

Claims

1. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate;

a projection system configured to project a patterned beam onto a target portion of the substrate;

a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between the projection system and the substrate;

a sensor system configured to measure a position of the substrate or of another substrate, a sensor system configured to measure a gap between an edge of the substrate, or of another substrate, disposed inside the depression and an edge of the depression, or a sensor system configured to measure both the position and the gap; and

a substrate handling system configured to position, using the measurement by the sensor system or a parameter derived from the measurement, the substrate inside the depression such that the gap between the edge of the substrate and the edge of the depression is substantially uniform inside the depression.

2. The apparatus according to claim 1, wherein the substrate handling system is further configured to be calibrated to correct for an offset between the substrate or the other substrate, and the depression.

3. The apparatus according to claim 1, wherein the substrate handling system or the sensor system is further configured to determine an offset between a center of the substrate or the other substrate, and a center of the depression.

4. The apparatus according to claim 1, wherein the another substrate is a test substrate and wherein the sensor system is further configured to measure a position of an alignment mark of the test substrate disposed inside the depression, and wherein the substrate handling system or the sensor system is further configured to determine an offset between a center of the test substrate and a center of the depression from the position of the alignment mark measured by the sensor system.

5. The apparatus according to claim 1, wherein the substrate handling system is further configured to determine to what extent the substrate should be translated in a plane substantially parallel to the substrate table to allow the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression.

6. The apparatus according to claim 5, wherein the substrate handling system is further configured to determine an offset between the substrate and the depression from determination of the translation in the plane.

7. The apparatus according to claim 1, wherein the substrate handling system or the sensor system is further configured to determine a center of the substrate or the other substrate, using measurements of the gap and to determine a substrate offset of the substrate or the other substrate, between a center of the depression and the determined center of the substrate or the other substrate.

8. The apparatus according to claim 7, further comprising a prealigner configured to measure a center of the substrate or the other substrate, at the prealigner and wherein the substrate handling system, the sensor system or the prealigner is further configured to determine a centering offset at the prealigner between a nominal center of the substrate or the other substrate, and the measured center of the substrate or the other substrate, at the prealigner.

9. The apparatus according to claim 8, wherein the substrate handling system or the sensor system is further configured to combine the substrate offset and the centering offset to obtain a global centering offset.

10. A method comprising:

(i) measuring a gap between an edge of a substrate or of another substrate and an edge of a depression of a substrate table, or (ii) measuring a position of the substrate or of another substrate, or (iii) measuring the edge of the depression, or (iv) any combination selected from (i)-(iii); and

using the measurement or a parameter derived from the measurement, positioning the substrate inside the depression such that the gap between the edge of the substrate and the edge of the depression is substantially uniform inside the depression and/or positioning the substrate so as to allow the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table; and

projecting a patterned beam onto a target portion of the substrate.

11. The method according to claim 10, comprising measuring the edge of the depression and further comprising calculating a center of the depression from the measured edge of the depression and wherein the positioning uses the calculated center of the depression.

12. The method according to claim 10, further comprising wherein determining a centering offset between a center of the depression and a center of the substrate or of the other substrate, and wherein the positioning uses the centering offset.

13. The method according to claim 10, wherein measuring the gap comprises scanning the gap across an optical beam and measuring an intensity variation in a reflection of the optical beam.

14. The method according to claim 10, comprising measuring the gap and further comprising determining a center of the substrate or of the other substrate using the measurements of the gap by determining a position of the edge of the substrate or the other substrate and calculating the position of the center of the substrate or the other substrate from the position of the edge.

15. The method according to claim 10, wherein the substrate is disposed inside the depression and removed from the depression using a substrate handler.

16. The method according to claim 15, further comprising calibrating the substrate handler to take into account at least a centering offset between a center of the depression and a center of the substrate or the other substrate.

17. The method according to claim 16, wherein calibrating the substrate handler includes shifting positioning of substrates by the substrate handler by an offset to correct for the centering offset so that a subsequently positioned substrate is substantially centered inside the depression.

18. The method according to claim 16, wherein calibrating the substrate handler includes correcting for substrate positioning so that the gap of a subsequently positioned substrate is substantially equally wide inside the depression.

19. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate;

a projection system configured to project a patterned beam onto a target portion of the substrate;

a sensor configured to measure the substrate or another substrate;

a substrate handling system configured to determine, based on measurement by the sensor, a centering offset of a central portion of the substrate or of another substrate, with respect to a central portion of the depression, and configured to position the substrate inside the depression by shifting a position of the substrate by an offset to correct for the centering offset to allow the substrate to enter inside the depression without colliding with a surface of the substrate table or an edge of the depression in the substrate table.

20. The apparatus according to claim 19, wherein the substrate handling system is further configured to place the substrate substantially centered into the depression.

21. The apparatus according to claim 19, wherein the substrate handling system comprises a movable pin located at the substrate table.

22. The apparatus according to claim 19, wherein the substrate handling system is further configured to shift the position of the substrate by translating the substrate above the depression.

23. The apparatus according to claim 19, wherein the substrate handling system is further configured to determine a position of the central point of the depression.

24. The apparatus according to claim 23, wherein the sensor is further configured to measure the edge of the depression and the substrate handling system is further configured to determine the position of the central point of the depression based on the measured edge of the depression.

25. The apparatus according to claim 19, wherein the substrate handling system is further configured to determine a position of the central portion of the substrate based on the measurement of the substrate.

26. The apparatus according to claim 19, wherein the substrate handling system is further configured to place the substrate into the depression with an upper surface of the substrate being at substantially a same level as an upper surface of the substrate table.

27. The apparatus according to claim 19, further comprising a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between the projection system and the substrate.

28. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate;

a projection system configured to project a patterned beam onto a target portion of the substrate;

a sensor system configured to measure (i) a position of the substrate or of another substrate, or (ii) a gap between an edge of the substrate, or of another substrate, disposed inside the depression and an edge of the depression, or (iii) measure the edge of the depression, or (iv) any combination selected from (i)-(iii); and

a substrate handling system configured to position, using the measurement by the sensor system, the substrate so as to allow the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table.

29. The apparatus according to claim 28, wherein the sensor system is configured to measure the position of the substrate or of the other substrate, and wherein the substrate handling system is further configured to position the substrate using a relative position between the substrate or the other substrate, and the substrate table determined based on the measured position of the substrate or of the other substrate.

30. The apparatus according to claim 28, wherein the sensor system is configured to measure the edge of the depression and wherein the substrate handling system is further configured to position the substrate using a position of a central point of the depression determined based on the measured edge of the depression.

31. The apparatus according to claim 28, wherein the sensor system is configured to measure the gap between an edge of the substrate, or of another substrate, disposed inside the depression and an edge of the depression and wherein the substrate handling system is further configured to position the substrate using a position of a central point of the substrate or the other substrate determined based on the measured gap.

32. The apparatus according to claim 28, wherein the substrate handling system is further configured to determine an offset between a center of the substrate or the other substrate, and a center of the depression, and to position the substrate using the offset.

33. The apparatus according to claim 28, wherein the substrate handling system is configured to place the substrate substantially centered into the depression.

34. The apparatus according to claim 28, wherein the substrate handling system is further configured to determine to what extent the substrate should be translated in a plane substantially parallel to the substrate table to allow the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression.

35. The apparatus according to claim 28, further comprising a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between the projection system and the substrate.

36. A method comprising:

measuring a parameter of the substrate or of another substrate and/or a parameter of an edge of a depression of a substrate table;

determining an offset between a position of a portion of the substrate and a portion of the depression based on the measured parameter;

positioning, using the offset, the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table; and

projecting a patterned beam onto a target portion of the substrate.

37. The method according to claim 36, comprising measuring the parameter of the substrate or the other substrate, the measuring further comprising measuring a mark on the substrate or the other substrate and the determining further comprising determining a relative position between the substrate or other substrate and the depression based on the measured mark.

38. The method according to claim 36, comprising measuring the parameter of the substrate or the other substrate, the measuring comprising measuring a gap between the edge of the depression and an edge of the substrate or the other substrate and the determining further comprising determining a position of the portion of the substrate or other substrate based on the measured gap.

39. The method according to claim 36, comprising measuring the parameter of the edge of the depression and the determining further comprising determining a position of the portion of the depression based on the measured parameter of the edge of the depression.

40. The method according to claim 36, further comprising placing the substrate substantially centered into the depression.

41. The method according to claim 36, wherein determining the offset comprising determining an offset between a center of the substrate or the other substrate, and a center of the depression.

42. The method according to claim 36, wherein the positioning further comprises placing the substrate into the depression with an upper surface of the substrate being at substantially a same level as an upper surface of the substrate table.

43. The method according to claim 36, wherein the positioning further comprises placing the substrate inside the depression such that a gap around the substrate and between an edge of the substrate and the edge of the depression is substantially uniform inside the depression.

44. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate;

a projection system configured to project a patterned beam onto a target portion of the substrate;

a sensor configured to measure a parameter of the substrate or of another substrate and/or a parameter of an edge of a depression of a substrate table; and

a substrate handling system configured to determine an offset between a position of a portion of the substrate and a portion of the depression based on the measured parameter and configured to position, using the offset, the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table.

45. The apparatus according to claim 44, wherein the sensor is configured to measure the parameter of the substrate or the other substrate, the sensor is further configured to measure a mark on the substrate or the other substrate and the substrate handling system is further configured to determine a relative position between the substrate or other substrate and the depression based on the measured mark.

46. The apparatus according to claim 44, wherein the sensor is configured to measure the parameter of the substrate or the other substrate, the sensor is further configured to measure a gap between the edge of the depression and an edge of the substrate or the other substrate and the substrate handling system is further configured to determine a position of the portion of the substrate or other substrate based on the measured gap.

47. The apparatus according to claim 44, wherein the sensor is configured to measure the parameter of the edge of the depression and the substrate handling system is further configured to determine a position of the portion of the depression based on the measured parameter of the edge of the depression.

48. The apparatus according to claim 44, wherein the substrate handling system is further configured to place the substrate substantially centered into the depression.

49. The apparatus according to claim 44, wherein the substrate handling system is configured to determine an offset between a center of the substrate or the other substrate, and a center of the depression.

50. The apparatus according to claim 44, further comprising a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between the projection system and the substrate.

51. The apparatus according to claim 44, wherein the substrate handling system is further configured to place the substrate into the depression with an upper surface of the substrate being at substantially a same level as an upper surface of the substrate table.

52. The apparatus according to claim 44, wherein the substrate handling system is further configured to place the substrate inside the depression such that a gap around the substrate and between an edge of the substrate and the edge of the depression is substantially uniform inside the depression.

53. The apparatus according to claim 44, wherein the substrate handling system comprises a movable pin located at the substrate table.