×

Plasma equipment and methods of using the same

  • US 9,184,031 B2
  • Filed: 07/16/2012
  • Issued: 11/10/2015
  • Est. Priority Date: 10/19/2011
  • Status: Active Grant
First Claim
Patent Images

1. Plasma equipment comprising:

  • a chamber in which a plasma reaction occurs;

    a detector configured to output a spectrum signal in response to light generated from the plasma reaction; and

    a plasma monitoring module configured to determine whether the spectrum signal includes an arcing signal or a hunting signal,wherein the plasma monitoring module comprises a high pass filter configured to output a high frequency signal in response to the spectrum signal,wherein the plasma monitoring module further comprises a probability analyzer configured to apply an amplitude variation of the high frequency signal to a probability function to determine whether the high frequency signal includes the arcing signal or the hunting signal.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×