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Laser diodes with an etched facet and surface treatment

  • US 9,184,563 B1
  • Filed: 08/26/2013
  • Issued: 11/10/2015
  • Est. Priority Date: 08/30/2012
  • Status: Active Grant
First Claim
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1. A laser diode device comprising:

  • a substrate having a gallium- and nitrogen-containing surface, the substrate comprising a surface region and at least a first edge region; and

    a laser stripe overlying a portion of the surface region of the substrate, the laser stripe characterized by a length in a length direction, a first end, and a second, opposite end, the length direction being substantially orthogonal to the first edge region of the substrate, the laser stripe comprising;

    an n-type cladding region overlying the surface region of the substrate;

    an active region overlying the n-type cladding region, the active region comprising a quantum well structure or a double hetero-structure; and

    a p-type cladding region overlying the active region;

    wherein the first end of the laser stripe comprises a first etched facet, and the second end of the laser stripe comprises a second etched facet, the first etched facet having a primary emission surface, the first etched facet being substantially parallel to and recessed from the first edge region of the substrate in the length direction, the first etched facet including a first portion of the n-type cladding region, and the first edge region including a second portion of the n-type cladding region;

    wherein the laser stripe is operable to emit electromagnetic radiation in a wavelength range selected from a first range from about 400 nm to about 435 nm, a second range from about 435 nm to about 480 nm, a third range from about 480 nm to about 505 nm, and a fourth range from about 505 nm to about 550 nm, and wherein the first edge region of the substrate comprises a first surface-treated region configured to interact with the electromagnetic radiation emitted by the laser stripe and propagating in the substrate.

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