Method of forming a light emitting diode structure and a light diode structure
First Claim
1. A method of forming a vertical III-nitride based light emitting diode structure, the method comprising,forming a III-nitride based light emitting structure on a silicon-on-insulator (SOI) substrate;
- forming a metal-based electrode structure on the III-nitride based light emitting structure; and
removing the SOI substrate by a layer transfer process such that the metal-based electrode structure functions as a metal-based substrate of the light emitting structure;
wherein the method further comprises creating an inhomogeneous Group III metal content in the III-nitride based light emitting structure for modulating emission spectra of the light emitting diode structure by patterning a buried oxide layer of the SOI substrate.
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Abstract
A method of forming a vertical III-nitride based light emitting diode structure and a vertical III-nitride based light emitting diode structure can be provided. The method comprises forming a III-nitride based light emitting structure on a silicon-on-insulator (SOI) substrate; forming a metal-based electrode structure on the III-nitride based light emitting structure; and removing the SOI substrate by a layer transfer process such that the metal-based electrode structure functions as a metal-based substrate of the light emitting structure.
68 Citations
24 Claims
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1. A method of forming a vertical III-nitride based light emitting diode structure, the method comprising,
forming a III-nitride based light emitting structure on a silicon-on-insulator (SOI) substrate; -
forming a metal-based electrode structure on the III-nitride based light emitting structure; and removing the SOI substrate by a layer transfer process such that the metal-based electrode structure functions as a metal-based substrate of the light emitting structure; wherein the method further comprises creating an inhomogeneous Group III metal content in the III-nitride based light emitting structure for modulating emission spectra of the light emitting diode structure by patterning a buried oxide layer of the SOI substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A method of forming a vertical III-nitride based light emitting diode structure, the method comprising,
patterning a buried oxide layer of a silicon-on-insulator (SOI) substrate; -
forming a III-nitride based light emitting structure on the patterned SOI substrate; removing the patterned SOI substrate; and creating an inhomogeneous Group III metal content in the III-nitride based light emitting structure for modulating the emission spectra from the light emitting diode structure using the buried oxide layer patterned in the patterning step. - View Dependent Claims (19, 20, 21, 22, 23, 24)
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