Nitride semiconductor light emitting device and fabrication method thereof
First Claim
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1. A light emitting device comprising:
- a first conductive type semiconductor layer;
an active layer on the first conductive type semiconductor layer; and
a second conductive type semiconductor layer on the active layer;
wherein the second conductive type semiconductor layer comprises a delta doped delta-doped p-type semiconductor layer on the active layer,wherein the delta-doped p-type semiconductor layer includes at least a first p-type nitride semiconductor layer near the active layer and at least a delta-doped second p-type nitride semiconductor layer that goes away from the active layer, andwherein the first conductive type semiconductor layer comprises a GaN layer and the delta doped second p-type nitride semiconductor layer comprises a GaN layer.
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Abstract
Provided is a nitride semiconductor light emitting device including: a first nitride semiconductor layer; an active layer formed above the first nitride semiconductor layer; and a delta doped second nitride semiconductor layer formed above the active layer. According to the present invention, the optical power of the nitride semiconductor light emitting device is enhanced, optical power down phenomenon is improved and reliability against ESD (electro static discharge) is enhanced.
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Citations
19 Claims
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1. A light emitting device comprising:
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a first conductive type semiconductor layer; an active layer on the first conductive type semiconductor layer; and a second conductive type semiconductor layer on the active layer; wherein the second conductive type semiconductor layer comprises a delta doped delta-doped p-type semiconductor layer on the active layer, wherein the delta-doped p-type semiconductor layer includes at least a first p-type nitride semiconductor layer near the active layer and at least a delta-doped second p-type nitride semiconductor layer that goes away from the active layer, and wherein the first conductive type semiconductor layer comprises a GaN layer and the delta doped second p-type nitride semiconductor layer comprises a GaN layer. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A light emitting device comprising:
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a first conductive type semiconductor layer; an active layer on the first conductive type semiconductor layer; and a second conductive type semiconductor layer on the active layer, wherein the second conductive type semiconductor layer comprises a delta doped p-type semiconductor layer on the active layer, wherein the second conductive type semiconductor layer includes a p-type dopant, and wherein the second conductive type semiconductor layer has a doping profile comprising a plurality of peaks. - View Dependent Claims (8)
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9. A light emitting device comprising:
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a first nitride semiconductor layer; an active layer on the first nitride semiconductor layer; a second nitride semiconductor layer on the active layer; and wherein the active layer includes a quantum well structure for emitting light, wherein the first nitride semiconductor layer includes a super lattice structure having at least two layers, and wherein the second nitride semiconductor layer includes a p-type impurity, the p-type impurity having a doping profile, and wherein the second nitride semiconductor layer comprises a p-type Al GaN layer and the p-type AlGaN layer includes Mg—
Al—
In. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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Specification