Latch-up free vertical TVS diode array structure using trench isolation
First Claim
1. A method for manufacturing a transient voltage suppressing (TVS) array comprising:
- opening a plurality of isolation trenches in an epitaxial layer of a first conductivity type in a semiconductor substrate to form a first, second, third, fourth, and fifth semiconductor regions separated by said isolation trenches;
doping a body region having a second conductivity type in an upper part of said epitaxial layer with the body region extends laterally over an entire length of the first semiconductor region between two of the isolation trenches;
implanting a plurality of doped regions of said first conductivity type the semiconductor regions including a top doped region of the first conductivity type disposed under a top surface of the substrate encompassed in said body region and extends laterally over substantially an entire length of the first semiconductor region to constitute a bipolar transistor comprising two vertically stacked PN junctions disposed between the isolation trenches for triggering the bipolar transistor by a Zener diode comprising a bottom vertically stacked PN junction between the body region and the epitaxial layer for carrying a transient current for suppressing a transient voltage wherein the step of implanting the doped regions of the first conductivity type further implanting dopant regions of the first conductivity type interfacing with the body region as a first and a second low side diodes in the second and third semiconductor regions to work with the Zener diode as part of the TVS array;
implanting dopant regions of the second conductivity type in the fourth and fifth semiconductor regions wherein the dopant regions of the second conductivity type interface with the epitaxial layer of the first conductivity type as a first high side diode and a second high side diode respectively for the TVS array; and
filling the isolation trenches with an isolation trench material to prevent a latch-up of parasitic transistors inherently formed between multiple PN junctions in the TVS array.
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Abstract
A method for manufacturing a transient voltage suppressing (TVS) array substantially following a manufacturing process for manufacturing a vertical semiconductor power device. The method includes a step of opening a plurality of isolation trenches in an epitaxial layer of a first conductivity type in a semiconductor substrate followed by applying a body mask for doping a body region having a second conductivity type between two of the isolation trenches. The method further includes a step of applying an source mask for implanting a plurality of doped regions of the first conductivity type constituting a plurality of diodes wherein the isolation trenches isolating and preventing parasitic PNP or NPN transistor due to a latch-up between the doped regions of different conductivity types.
8 Citations
14 Claims
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1. A method for manufacturing a transient voltage suppressing (TVS) array comprising:
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opening a plurality of isolation trenches in an epitaxial layer of a first conductivity type in a semiconductor substrate to form a first, second, third, fourth, and fifth semiconductor regions separated by said isolation trenches; doping a body region having a second conductivity type in an upper part of said epitaxial layer with the body region extends laterally over an entire length of the first semiconductor region between two of the isolation trenches; implanting a plurality of doped regions of said first conductivity type the semiconductor regions including a top doped region of the first conductivity type disposed under a top surface of the substrate encompassed in said body region and extends laterally over substantially an entire length of the first semiconductor region to constitute a bipolar transistor comprising two vertically stacked PN junctions disposed between the isolation trenches for triggering the bipolar transistor by a Zener diode comprising a bottom vertically stacked PN junction between the body region and the epitaxial layer for carrying a transient current for suppressing a transient voltage wherein the step of implanting the doped regions of the first conductivity type further implanting dopant regions of the first conductivity type interfacing with the body region as a first and a second low side diodes in the second and third semiconductor regions to work with the Zener diode as part of the TVS array; implanting dopant regions of the second conductivity type in the fourth and fifth semiconductor regions wherein the dopant regions of the second conductivity type interface with the epitaxial layer of the first conductivity type as a first high side diode and a second high side diode respectively for the TVS array; and filling the isolation trenches with an isolation trench material to prevent a latch-up of parasitic transistors inherently formed between multiple PN junctions in the TVS array. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method for manufacturing a transient voltage suppressing (TVS) array comprising:
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opening a plurality of isolation trenches in an epitaxial layer of a first conductivity type in a semiconductor substrate to separate a plurality of semiconductor regions separated by the isolation trenches; doping a body region having a second conductivity type in an upper part of said epitaxial layer with the body region extends laterally over an entire length of a first semiconductor region between two of the isolation trenches; implanting a plurality of doped regions of said first conductivity type in each of the semiconductor regions including a top doped region of the first conductivity type disposed under a top surface of the substrate encompassed in said body region and extends laterally over substantially an entire length of the first semiconductor region to constitute a bipolar transistor comprising vertically stacked PN junctions disposed between two of the isolation trenches for triggering the bipolar transistor by a Zener diode comprising a bottom vertically stacked PN junction between the body region and the epitaxial layer for carrying a transient current for suppressing a transient voltage wherein the step of implanting the doped regions of the first conductivity type further implanting dopant regions of the first conductivity type interfacing with the body region as a first low side diode and a second low side diode to work with the Zener diode as part of the TVS array;
implanting doped regions of the second conductivity type away from the body region for forming a first high side diode and a second high side diode with said epitaxial layer;filling the isolation trenches with an isolation trench material; and forming and patterning a top metal layer over the substrate in contact with the doped regions of the first conductivity type on top of the bipolar transistor constituting a cathode electrode and forming a bottom metal layer in contact with the semiconductor substrate constituting an anode electrode. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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Specification