Source mask optimization to reduce stochastic effects
First Claim
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1. A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising:
- determining a stochastic effect function of the lithographic process that produces as an output a value of a stochastic effect as a function of a plurality of design variables associated with the lithographic process that are inputs to the function and which cause quantifiable changes in the stochastic effect value, wherein the plurality of design variables include at least an adjustable parameter of projection optics of the lithographic process;
defining a multi-variable cost function using the stochastic effect function of the lithographic process such that the multi-variable cost function includes the adjustable parameter of projection optics that causes the quantifiable changes in the stochastic effect value for a desired substrate throughput of the lithographic projection apparatus; and
reconfiguring, by the computer, one or more characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition of the cost function is satisfied, thereby achieving the desired substrate throughput.
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Abstract
Disclosed herein is a computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process.
31 Citations
27 Claims
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1. A computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising:
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determining a stochastic effect function of the lithographic process that produces as an output a value of a stochastic effect as a function of a plurality of design variables associated with the lithographic process that are inputs to the function and which cause quantifiable changes in the stochastic effect value, wherein the plurality of design variables include at least an adjustable parameter of projection optics of the lithographic process; defining a multi-variable cost function using the stochastic effect function of the lithographic process such that the multi-variable cost function includes the adjustable parameter of projection optics that causes the quantifiable changes in the stochastic effect value for a desired substrate throughput of the lithographic projection apparatus; and reconfiguring, by the computer, one or more characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition of the cost function is satisfied, thereby achieving the desired substrate throughput. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A computer-implemented method for increasing a substrate throughput of a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising:
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determining a stochastic effect function of the lithographic process that produces as an output a value of a stochastic effect as a function of a plurality of design variables associated with the lithographic process that are inputs to the function and which cause quantifiable changes in the stochastic effect value, wherein the plurality of design variables include at least an adjustable parameter of projection optics of the lithographic process; defining a multi-variable cost function using the stochastic effect function of the lithographic process such that the multi-variable cost function includes the adjustable parameter of projection optics that causes the quantifiable changes in the stochastic effect value for a desired substrate throughput of the lithographic projection apparatus, the cost function further being a function of an exposure time of the substrate in the lithographic projection apparatus; and reconfiguring, by the computer, one or more characteristics of the lithographic process by adjusting one or more of the design variables until a certain termination condition of the cost function is satisfied, thereby achieving the desired substrate throughput. - View Dependent Claims (24, 25, 26, 27)
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Specification