Ferroelectric liquid crystal display device comprising gate-overlapped lightly doped drain structure
First Claim
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1. A display device comprising:
- a pixel circuit over a substrate, comprising;
a gate wiring over the substrate;
a source wiring crossing the gate wiring;
a first pixel and a second pixel adjacent to each other with the gate wiring interposed therebetween, the first pixel comprising;
a pixel TFT comprising;
a first portion of a semiconductor layer comprising a channel formation region, a pair of LDD regions, a source region and a drain region;
a gate insulating film provided over the semiconductor layer; and
a gate electrode provided over the gate insulating film, each of the pair of LDD regions comprising a first top portion overlapping with the gate electrode and a second top portion not overlapping with the gate electrode, a capacitor comprising a capacitor electrode, a second portion of the semiconductor layer overlapped with the capacitor electrode, and a portion of the gate insulating film overlapped with the capacitor electrode;
wherein the gate electrode is a portion of the gate wiring,wherein the first portion of the semiconductor layer is overlapped with the source wiring,an insulating film comprising silicon nitride over the pixel TFT,wherein the gate electrode comprises a first conductive layer, a second conductive layer provided over the first conductive layer, and a third conductive layer provided over the second conductive layer, the third conductive layer being in direct contact with a side surface of the second conductive layer, a side surface of the first conductive layer, and the gate insulating film;
wherein the first conductive layer and the third conductive layer each comprise a material selected from the group consisting of titanium, tantalum, tungsten and molybdenum, andwherein the second conductive layer comprises a material selected from the group consisting of aluminum and copper.
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Abstract
The present invention relates to a semiconductor device including a circuit composed of thin film transistors having a novel GOLD (Gate-Overlapped LDD (Lightly Doped Drain)) structure. The thin film transistor comprises a first gate electrode and a second electrode being in contact with the first gate electrode and a gate insulating film. Further, the LDD is formed by using the first gate electrode as a mask, and source and drain regions are formed by using the second gate electrode as the mask. Then, the LDD overlapping with the second gate electrode is formed. This structure provides the thin film transistor with high reliability.
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Citations
22 Claims
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1. A display device comprising:
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a pixel circuit over a substrate, comprising; a gate wiring over the substrate; a source wiring crossing the gate wiring; a first pixel and a second pixel adjacent to each other with the gate wiring interposed therebetween, the first pixel comprising; a pixel TFT comprising; a first portion of a semiconductor layer comprising a channel formation region, a pair of LDD regions, a source region and a drain region; a gate insulating film provided over the semiconductor layer; and a gate electrode provided over the gate insulating film, each of the pair of LDD regions comprising a first top portion overlapping with the gate electrode and a second top portion not overlapping with the gate electrode, a capacitor comprising a capacitor electrode, a second portion of the semiconductor layer overlapped with the capacitor electrode, and a portion of the gate insulating film overlapped with the capacitor electrode; wherein the gate electrode is a portion of the gate wiring, wherein the first portion of the semiconductor layer is overlapped with the source wiring, an insulating film comprising silicon nitride over the pixel TFT, wherein the gate electrode comprises a first conductive layer, a second conductive layer provided over the first conductive layer, and a third conductive layer provided over the second conductive layer, the third conductive layer being in direct contact with a side surface of the second conductive layer, a side surface of the first conductive layer, and the gate insulating film; wherein the first conductive layer and the third conductive layer each comprise a material selected from the group consisting of titanium, tantalum, tungsten and molybdenum, and wherein the second conductive layer comprises a material selected from the group consisting of aluminum and copper. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A display device comprising:
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a substrate; a transistor over the substrate, the transistor comprising a semiconductor layer formed on an insulating surface, the semiconductor layer comprising a channel formation region; an electrode of a capacitor over the substrate, the electrode comprising an n-type semiconductor layer formed on the insulating surface; a first insulating film over the transistor and the electrode of the capacitor; a first electrode over the first insulating film and electrically connected to the transistor; a light emitting layer over the first electrode, the light emitting layer comprising an organic compound; a second electrode over the first electrode so that the light emitting layer is disposed between the first electrode and the second electrode; a covering material over the second electrode, wherein a main surface of the covering material faces the second electrode; a first sealing material interposed between the substrate and the covering material, wherein the first sealing material is disposed along peripheries of the substrate and the covering material; and a second sealing material outside of and along the first sealing material, wherein the second sealing material is continuous and is in contact with a side surface and a first part of a rear surface of the covering material and is not in contact with a second part of the rear surface, wherein the rear surface is a surface opposite to the main surface, and wherein the side surface is a surface between the main surface and the rear surface. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16)
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17. A display device comprising:
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a substrate having an insulating surface; a transistor comprising a crystalline silicon layer over the insulating surface, a gate insulating film over the crystalline silicon layer, and a gate electrode over the gate insulating film; a capacitor over the insulating surface, the capacitor including a first capacitor electrode comprising an n-type semiconductor layer, a first insulating film formed of the same layer as the gate insulating film over the first capacitor electrode, and a second capacitor electrode comprising the same layer as the gate electrode over the first insulating film; a second insulating film over the transistor and the capacitor; a first electrode over the second insulating film and electrically connected to the transistor; a light emitting layer over the first electrode, the light emitting layer comprising an organic compound; a second electrode over the first electrode so that the light emitting layer is disposed between the first electrode and the second electrode; a covering material over the second electrode, wherein a main surface of the covering material faces the second electrode; a first sealing material interposed between the substrate and the covering material, wherein the first sealing material is disposed along peripheries of the substrate and the covering material; and a second sealing material outside of and along the first sealing material, wherein the second sealing material is continuous and is in contact with a side surface and a first part of a rear surface of the covering material and is not in contact with a second part of the rear surface, wherein the rear surface is a surface opposite to the main surface, and wherein the side surface is a surface between the main surface and the rear surface. - View Dependent Claims (18, 19, 20, 21, 22)
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Specification