Illumination system for a microlithographic projection exposure apparatus

• US 9,217,930 B2
• Filed: 02/06/2013
• Issued: 12/22/2015
• Est. Priority Date: 02/17/2006
• Status: Expired due to Fees

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Inventors: Wangler, Johannes, Siekmann, Heiko, Weible, Kenneth, Scharnweber, Ralf, Maul, Manfred, Deguenther, Markus, Layh, Michael, Scholz, Axel, Spengler, Uwe, Voelkel, Reinhard
• Primary Examiner(s): KREUTZER, COLIN WRIGHT
• Application Number:
  US13/760,268
• Publication Number:
  US 20130148092A1
• Time in Patent Office: 1,049 Days
• Field of Search: 355/53, 355/67, 355/71, 355/77, 359/619, 359621-624, 359/626, 359/628
• US Class Current: 1/1
• CPC Class Codes: G02B 27/0911 Anamorphotic systems
• CPC Class Codes: G02B 3/0056 arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses G02B3/0043 takes precedence; miniaturised objectives for electronic devices employing wafer level optics G02B13/0085
• CPC Class Codes: G03F 7/70058 Mask illumination systems
• CPC Class Codes: G03F 7/70075 Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
• CPC Class Codes: G03F 7/70083 Non-homogeneous intensity distribution in the mask plane
• CPC Class Codes: G03F 7/70158 Diffractive optical elements
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Abstract

Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

Claims

1. An optical system, comprising:

a light source;

an optical integrator comprising a plurality of first optical subelements, the optical integrator being configured to produce a plurality of secondary light sources each emitting a light bundle during use of the optical system;

a condenser configured to effect a superposition of the light bundles in a field plane during use of the optical system;

a first scattering structure comprising a plurality of second optical subelements, the first scattering structure being before the optical integrator in a light propagation direction of the optical system, each second optical subelement being configured to produce a substantially rectangular angular light distribution during use of the optical system; and

a second scattering structure between the optical integrator and the condenser along the light propagation direction of the optical system,

wherein the optical system is a micro lithographic illumination system.

2. The optical system of claim 1, wherein the optical integrator comprises a fly-eye integrator comprising first and second integrator members, and each of the first and second integrator members comprises a plurality of the first focusing optical subelements.

3. The optical system of claim 2, wherein each of the second optical subelements is configured so that, during use of the optical system, each of the second optical subelements produces an angular light distribution that suffices to completely illuminate, together with the first optical subelements of the first integrator member, first optical subelements of the second integrator member.

4. The optical system of claim 1, wherein the second optical subelements are arranged in a periodic array.

5. The optical system of claim 1, wherein, in a direction perpendicular to an optical axis of the optical system, the first optical subelements have a first pitch and the second optical subelements have a second pitch different from the first pitch.

6. The optical system of claim 5, wherein the second optical subelements are arranged in a periodic array, and the first pitch is prime to the second pitch.

7. The optical system of claim 1, wherein the second scattering structure comprises optical subelements arranged in a non-periodic array.

8. The optical system of claim 1, wherein the first optical subelements have, along a direction in which a geometrical optical flux is increased, a first pitch which is less than 1000 μ

m.

9. The optical system of claim 8, wherein the first pitch is less than 600 μ

m.

10. The optical system of claim 8, wherein the second optical subelements have, along a direction in which a geometrical optical flux is increased, a second pitch which is less than the first pitch.

11. The optical system of claim 1, wherein each of the second optical subelements comprises a microlens.

12. The optical system of claim 11, wherein at least some of the microlenses have a cylindrical shape.

13. The optical system of claim 1, wherein each of the second optical subelements is configured to produce an anamorphic angular light distribution during use of the optical system so that a geometrical optical flux is increased to different extents in orthogonal directions.

14. The optical system of claim 13, wherein a projection exposure apparatus contains the optical system, the projection exposure apparatus has a scan direction, and the geometrical optical flux is increased along the scan direction of the projection exposure apparatus to a smaller extent than perpendicular to the scan direction.

15. The optical system of claim 14, wherein the geometrical optical flux is not substantially increased along the scan direction of the projection exposure apparatus.

16. The optical system of claim 1, wherein a distance between the first scattering structure and the optical integrator is different from a Talbot distance of the first scattering structure.

17. The optical system of claim 1, wherein the first optical subelements have shapes defined by first borderlines, the second optical subelements have shapes defined by second borderlines, the first and second borderlines form an angle which is greater than 0.1°

and less than 89.9°

.

18. The optical system of claim 1, wherein the second scattering structure comprises first and second kinds of second optical subelements, the first kind of optical subelements are configured to increase a geometrical optical flux in a first direction during use of the optical system, and the second kind of optical subelements are configured to increase a geometrical optical flux in a second direction different from the first direction.

19. The optical system of claim 18, wherein the optical system is contained in a microlithographic projection exposure apparatus which has a scan direction, and the first kind of optical subelements are configured so that, during use of the optical system, the first kind of optical subelements produce a Gaussian angular light distribution in the scan direction of the microlithographic projection exposure apparatus.

20. The optical system of claim 19, wherein the Gaussian angular light distribution is approximated by a superposition of a plurality of substantially rectangular angular distributions of different width.

21. The optical system of claim 20, wherein the second type of optical subelements are cylindrical microlenses having different pitches.

22. The optical system of claim 18, wherein the optical system is contained in a microlithographic projection exposure apparatus which has a scan direction, and the second kind of optical subelements are configured so that, during use of the optical system, the second kind of optical subelements produce a rectangular angular light distribution perpendicular to the scan direction of the microlithographic projection exposure apparatus.

23. The optical system of claim 18, wherein the first and second kinds of optical subelements, respectively, are on opposite sides of a common support.

24. The optical system of claim 1, wherein the first and second scattering structures are configured to modify the angular distribution during use of the optical system in a way that would be obtained, in the absence of the at least one scattering structure, by enlarging the secondary light sources such that they abut or overlap.

25. An apparatus, comprising:

an optical system according to claim 1,

wherein the apparatus is microlithographic projection exposure apparatus.