Oxide terminated trench MOSFET with three or four masks
First Claim
1. A method for making an insulator termination semiconductor device, comprising:
- a) applying a trench mask to a semiconductor substrate;
b) etching the semiconductor substrate through the trench mask to form first and second sets of trenches, wherein the trenches in the second set are narrower than the trenches in the first set, wherein the first set includes an isolation trench that surrounds the second set of trenches;
c) forming a gate dielectric in the first and second sets of trenches;
d) doping a region of the semiconductor substrate under the isolation trench to form a channel stop;
e) depositing a conductive material into the first and second sets of trenches, wherein a thickness of the conductive material is selected to fill up the second set of trenches but not the isolation trench;
f) isotropically etching back the conductive material to form gate electrodes in the second set of trenches, wherein the conductive material is completely removed from the isolation trench;
g) filling the isolation trench with an insulator material to form an isolation structure that surrounds the gate electrodes;
h) forming a body layer in a top portion of the entire substrate;
i) forming a source layer in a top portion of the entire body layer;
wherein portions of the source layer and body layer inside a region surrounded by the isolation trench are at source potential and portions of the source layer and body layer that are outside the region surrounded by the isolation trench are at drain potential.
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Accused Products
Abstract
An oxide termination semiconductor device may comprise a plurality of gate trenches, a gate runner, and an insulator termination trench. The gate trenches are located in an active region. Each gate trench includes a conductive gate electrode. The insulator termination trench is located in a termination region that surrounds the active region. The insulator termination trench is filled with an insulator material to form an insulator termination for the semiconductor device. Source and body regions inside the active region are at source potential and source and body regions outside the isolation trench are at drain potential. The device can be made using a three-mask or four-mask process.
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Citations
22 Claims
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1. A method for making an insulator termination semiconductor device, comprising:
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a) applying a trench mask to a semiconductor substrate; b) etching the semiconductor substrate through the trench mask to form first and second sets of trenches, wherein the trenches in the second set are narrower than the trenches in the first set, wherein the first set includes an isolation trench that surrounds the second set of trenches; c) forming a gate dielectric in the first and second sets of trenches; d) doping a region of the semiconductor substrate under the isolation trench to form a channel stop; e) depositing a conductive material into the first and second sets of trenches, wherein a thickness of the conductive material is selected to fill up the second set of trenches but not the isolation trench; f) isotropically etching back the conductive material to form gate electrodes in the second set of trenches, wherein the conductive material is completely removed from the isolation trench; g) filling the isolation trench with an insulator material to form an isolation structure that surrounds the gate electrodes; h) forming a body layer in a top portion of the entire substrate; i) forming a source layer in a top portion of the entire body layer; wherein portions of the source layer and body layer inside a region surrounded by the isolation trench are at source potential and portions of the source layer and body layer that are outside the region surrounded by the isolation trench are at drain potential. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An insulator termination semiconductor device comprising:
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a plurality of gate trenches located in an active region, each of which includes a conductive gate electrode; an isolation trench located in a termination region that surrounds the active region, wherein the isolation trench is filled with an insulator material to form an insulator termination for the semiconductor device; a doped region of the semiconductor substrate under the isolation trench that forms a channel stop; and source and body regions throughout the device, wherein portions of the source and body regions inside the active region are at source potential and portions of the source and body regions outside the insulation isolation trench are at drain potential. - View Dependent Claims (12, 13, 14)
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15. A method for making a semiconductor device, comprising:
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a) applying a trench mask to a semiconductor substrate; b) etching the semiconductor substrate through the trench mask to form a gate runner trench; c) forming a dielectric material in the gate runner trench; d) forming a gate runner cavity in the dielectric material in the gate runner trench; e) forming a set of gate trenches in an active device region, wherein the gate runner trench is wider than the gate trenches, wherein the gate runner trench intersects at least a portion of the gate trenches; f) forming a gate dielectric in the gate trenches; g) depositing a conductive material into the gate runner cavity and the gate trenches; h) etching back the conductive material to form gate electrodes in the gate trenches and a gate runner in the gate runner cavity; i) forming a body layer in a top portion of the entire substrate; j) forming a source layer in a top portion of the entire body layer. - View Dependent Claims (16, 17, 18, 19)
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20. A semiconductor device comprising:
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a plurality of gate trenches located in an active region, each of which includes a conductive gate electrode; a gate runner trench having a gate runner formed therein; a doped region of the semiconductor substrate under the gate runner trench that forms a channel stop; and source and body regions throughout the device, wherein portions of the source and body regions inside the active region are at source potential and portions of the source and body regions outside an insulator isolation trench are at drain potential. - View Dependent Claims (21, 22)
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Specification