Internal electrical contact for enclosed MEMS devices
First Claim
1. A MEMS device comprising:
- a MEMS substrate, the MEMS substrate includes a first semiconductor layer, a second semiconductor layer and a dielectric layer in between, the first semiconductor layer has a first and second surfaces, wherein the first surface is in contact with the dielectric layer;
wherein MEMS structures are formed from the second semiconductor layer andincludes a plurality of first conductive pads;
a base substrate which includes a plurality of second conductive pads thereon;
wherein the second conductive pads are connected to the first conductive pads; and
a conductive connector formed through only the dielectric layer, the second semiconductor layer and the first surface of the first semiconductor layer to provide electrical coupling between the first semiconductor layer and the second semiconductor layer, whereby the base substrate is electrically connected to the second semiconductor layer and the first semiconductor layer.
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Accused Products
Abstract
A method of fabricating electrical connections in an integrated MEMS device is disclosed. The method comprises forming a MEMS wafer. Forming a MEMS wafer includes forming one cavity in a first semiconductor layer, bonding the first semiconductor layer to a second semiconductor layer with a dielectric layer disposed between the first semiconductor layer and the second semiconductor layer, and etching at least one via through the second semiconductor layer and the dielectric layer and depositing a conductive material on the second semiconductor layer and filling the at least one via. Forming a MEMS wafer also includes patterning and etching the conductive material to form one standoff and depositing a germanium layer on the conductive material, patterning and etching the germanium layer, and patterning and etching the second semiconductor layer to define one MEMS structure. The method also includes bonding the MEMS wafer to a base substrate.
31 Citations
14 Claims
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1. A MEMS device comprising:
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a MEMS substrate, the MEMS substrate includes a first semiconductor layer, a second semiconductor layer and a dielectric layer in between, the first semiconductor layer has a first and second surfaces, wherein the first surface is in contact with the dielectric layer; wherein MEMS structures are formed from the second semiconductor layer and includes a plurality of first conductive pads; a base substrate which includes a plurality of second conductive pads thereon;
wherein the second conductive pads are connected to the first conductive pads; anda conductive connector formed through only the dielectric layer, the second semiconductor layer and the first surface of the first semiconductor layer to provide electrical coupling between the first semiconductor layer and the second semiconductor layer, whereby the base substrate is electrically connected to the second semiconductor layer and the first semiconductor layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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Specification