Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
First Claim
1. A particle-optical arrangement comprising:
- at least one charged-particle source for generating at least one beam of charged particles;
at least one multi-aperture plate arranged in a beam path of the at least one beam of charged particles, wherein the at least one multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the at least one beam of charged particles downstream of the multiaperture plate, and wherein a plurality of beam spots is formed in an image plane of the particle-optical arrangement by the plurality of charged-particle beamlets; and
wherein a shape of at least one group of the apertures is an elliptical shape.
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Accused Products
Abstract
A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
107 Citations
10 Claims
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1. A particle-optical arrangement comprising:
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at least one charged-particle source for generating at least one beam of charged particles; at least one multi-aperture plate arranged in a beam path of the at least one beam of charged particles, wherein the at least one multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the at least one beam of charged particles downstream of the multiaperture plate, and wherein a plurality of beam spots is formed in an image plane of the particle-optical arrangement by the plurality of charged-particle beamlets; and wherein a shape of at least one group of the apertures is an elliptical shape. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A multi-electron-beamlet inspection system, comprising:
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a stage for mounting an object to be inspected; at least one electron source for generating at least one electron beam; a multi-aperture plate comprising a pattern of multiple apertures substantially in a plane perpendicular to the at least one electron beam, the multi-aperture plate dividing the at least one electron beam into an array of electron beamlets; an objective lens for focusing the array of electron beamlets on the object to be inspected; and a detector arrangement for detecting secondary electrons from the object generated by the array of electron beamlets, to produce an array of signals corresponding to the secondary electrons generated by substantially a single electron beamlet in the array of electron beamlets; wherein a shape of at least one group apertures of the multiple apertures is an elliptical shape.
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8. A method of multi-electron-beamlet inspection of a substrate, the method comprising:
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generating at least one electron beam; illuminating at least one multi-aperture plate with the at least one electron beam using at least one first electron optical component; dividing the at least one electron beam into an array of beamlets with the multi-aperture plate comprising a pattern of multiple apertures substantially in a plane perpendicular to the at least one electron beam; and forming an array of electron beam spots with the array of beamlets on the substrate using at least one second charged-particle optical component; wherein a shape of at least one group apertures of the multiple apertures is an elliptical shape.
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9. A charged-particle multi-beamlet lithography system for writing a pattern on a resist coated object, the system comprising:
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a stage for mounting the object; at least one charged-particle source for generating at least one charged-particle beam; a multi-aperture plate comprising a pattern of multiple apertures substantially in a plane perpendicular to the at least one charged-particle beam, the multi-aperture plate dividing the at least one charged-particle beam into an array of charged-particle beamlets; and an objective lens for focusing the array of charged-particle beamlets on the object; and wherein a shape of at least one group apertures of the multiple apertures is an elliptical shape.
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10. A method of writing a pattern on a resist coated object, the method comprising:
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generating at least one electron beam; illuminating at least one multi-aperture plate with the at least one electron beam using at least one first electron optical component; dividing the at least one electron beam into an array of beamlets with the multi-aperture plate comprising a pattern of multiple apertures substantially in a plane perpendicular to the at least one electron beam; and forming an array of electron beam spots on the resist coated object with the array of beamlets using at least one second charged-particle optical component; wherein a shape of at least one group apertures of the multiple apertures is an elliptical shape.
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Specification