Adjustable non-dissipative voltage boosting snubber network for achieving large boost voltages
First Claim
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1. A pulsed DC power supply system that provides pulsed DC power to a plurality of anodeless electrodes sustaining a plasma in a plasma processing chamber, the pulsed DC power supply system comprising:
- a DC power supply coupled to and providing a first DC power to a first and second rail, such that a rail voltage exists across the first and second rails;
a switching circuit coupled to the first and second rails and receiving the first DC power via the first and second rails and converting the first DC power to a first pulsed DC voltage configured for delivery to at least a first anodeless electrode of the plasma processing chamber; and
a voltage-boosting circuit coupled between the first and second rails, the voltage-boosting circuit comprising;
a first diode coupled between the first rail and a first electrical node and forward biased when a voltage measured from the first rail to the first electrical node is sufficiently positive to forward bias the first diode;
a capacitive element coupled between the first electrical node and the second rail;
a switch selectively coupling the first electrical node and a second electrical node;
a second diode coupled between the second rail and the second electrical node and forward biased when a voltage measured from the second rail to the second electrical node is sufficiently positive to forward bias the second electrical node; and
an inductive element coupled between the second electrical node and the first rail.
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Abstract
This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load'"'"'s impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a unidirectional switch, a voltage multiplier, and a current limiter. In some cases, these components can be a diode, voltage doubler, and an inductor, respectively.
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Citations
11 Claims
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1. A pulsed DC power supply system that provides pulsed DC power to a plurality of anodeless electrodes sustaining a plasma in a plasma processing chamber, the pulsed DC power supply system comprising:
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a DC power supply coupled to and providing a first DC power to a first and second rail, such that a rail voltage exists across the first and second rails; a switching circuit coupled to the first and second rails and receiving the first DC power via the first and second rails and converting the first DC power to a first pulsed DC voltage configured for delivery to at least a first anodeless electrode of the plasma processing chamber; and a voltage-boosting circuit coupled between the first and second rails, the voltage-boosting circuit comprising; a first diode coupled between the first rail and a first electrical node and forward biased when a voltage measured from the first rail to the first electrical node is sufficiently positive to forward bias the first diode; a capacitive element coupled between the first electrical node and the second rail; a switch selectively coupling the first electrical node and a second electrical node; a second diode coupled between the second rail and the second electrical node and forward biased when a voltage measured from the second rail to the second electrical node is sufficiently positive to forward bias the second electrical node; and an inductive element coupled between the second electrical node and the first rail. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A pulsed DC power supply system that provides pulsed DC power to a plurality of anodeless electrodes sustaining a plasma in a plasma processing chamber, the pulsed DC power supply system comprising:
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a DC power supply coupled to and providing a first DC power to a first and second rail, such that a rail voltage exists across the first and second rails; and a switching circuit coupled to the first and second rails and receiving the first DC power via the first and second rails and converting the first DC power to a first pulsed DC voltage configured for delivery to at least a first anodeless electrode of the plasma processing chamber; and a voltage-boosting circuit coupled between the first and second rails, the voltage-boosting circuit comprising; a first diode coupled between the first rail and a first electrical node, an anode of the first diode being at a voltage of the first rail; a capacitive element coupled between the first electrical node and the second rail; a switch selectively coupling the first electrical node and a second electrical node; a second diode coupled between the second rail and the second electrical node, an anode of the second diode being at a voltage of the second rail; and an inductive element coupled between the second electrical node and the first rail. - View Dependent Claims (8, 9, 10, 11)
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Specification