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Membrane-based sensor device with non-dielectric etch-stop layer around substrate recess

  • US 9,224,658 B2
  • Filed: 01/22/2014
  • Issued: 12/29/2015
  • Est. Priority Date: 01/31/2013
  • Status: Active Grant
First Claim
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1. A sensor device comprisinga substrate having a top and a bottom surface and an opening extending between said top and bottom surfaces,a batch of material layers applied to said top surface, wherein at least some of said material layers extend over said opening for forming a membrane,a heater arranged on said membrane,wherein said sensor device comprises a recess extending from below into said batch of material layers at a location of said membrane,wherein said batch of material layers further comprises at least one non-dielectric etch-stop layer extending in a ring around said recess, andwherein said ring is at level with a to surface of the recess.

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