Method and apparatus for fractional skin treatment

• US 9,227,081 B2
• Filed: 05/15/2014
• Issued: 01/05/2016
• Est. Priority Date: 07/20/2009
• Status: Active Grant

• Current Assignee: Syneron Medical Limited (Syneron Incorporated)
• Original Assignee: Syneron Medical Limited (Syneron Incorporated)
• Inventors: Adanny, Yossef Ori, Nahshon, Genady, Levine, Baruch, Rosenberg, Avner
• Primary Examiner(s): PEFFLEY, MICHAEL F
• Application Number:
  US14/277,865
• Publication Number:
  US 20140249522A1
• Time in Patent Office: 600 Days
• Field of Search: 606 32- 35, 606 41- 50
• US Class Current: 1/1
• CPC Class Codes: A61B 18/1233 with circuits for assuring patient safety
• CPC Class Codes: A61B 18/14 Probes or electrodes therefor
• CPC Class Codes: A61B 18/18 by applying electromagnetic radiation, e.g. microwaves radiation therapy A61N5/00
• CPC Class Codes: A61B 2018/0016 Energy applicators arranged in a two- or three dimensional array
• CPC Class Codes: A61B 2018/00452 Skin
• CPC Class Codes: A61B 2018/0047 Upper parts of the skin, e.g. skin peeling or treatment of wrinkles
• CPC Class Codes: A61B 2018/00577 Ablation
• CPC Class Codes: A61B 2018/00589 Coagulation
• CPC Class Codes: A61B 2018/00642 with feedback, i.e. closed loop control
• CPC Class Codes: A61B 2018/00702 Power or energy
• CPC Class Codes: A61B 2018/00827 Current
• CPC Class Codes: A61B 2018/00875 Resistance or impedance
• CPC Class Codes: A61B 2018/1467 using more than two electrodes on a single probe
• CPC Class Codes: A61B 2018/162 located on the probe body
• CPC Class Codes: A61B 2018/165 Multiple indifferent electrodes
• CPC Class Codes: A61N 1/0476 Array electrodes (including any electrode arrangement with more than one electrode for at least one of the polarities)
• CPC Class Codes: A61N 5/00 Radiation therapy ultrasound therapy A61N7/00; devices or apparatus applicable to both therapy and diagnosis A61B6/00

Abstract

An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Claims

1. An RF skin treatment apparatus, comprising:

an applicator configured to apply an RF pulse to a stratum corneum layer of skin through a tip having a plurality of skin-contacting electrodes associated therewith;

an RF voltage source separate from the applicator and configured to deliver RF energy to the applicator through an elongated harness; and

an isolating transformer located in the applicator and configured to be electrically disposed between the RF voltage source and the tip to reduce undesired current flow to the skin, wherein both ends of a secondary coil of the isolating transformer are configured to connect to the tip.

2. The RF skin treatment apparatus of claim 1, wherein the plurality of skin-contacting electrodes are arranged asymmetrically on the tip.

3. The RF skin treatment apparatus of claim 2, wherein the plurality of skin-contacting electrodes includes at least one electrode having a size greater than a size of other electrodes.

4. The RF skin treatment apparatus of claim 1, further including at least one processor configured to control energy applied to the stratum corneum in order to cause RF-based fractional skin treatment.

5. The RF skin treatment apparatus of claim 4, wherein the RE-based fractional skin treatment produces a pattern of micron size holes.

6. The RF skin treatment apparatus of claim 1, wherein the isolating transformer is configured to reduce ground currents due to parasitic capacitance.

7. The RF skin treatment apparatus of claim 1, further comprising at least one capacitor located at an end of the secondary coil and configured for electrical connection to at least some of the plurality of electrodes in order to form a high pass filter.

8. The RF skin treatment apparatus of claim 7, wherein the high pass filter is configured to filter out low frequency currents generated by plasma formed at the skin-contacting electrodes.

9. The RF skin treatment apparatus of claim 1, wherein the undesired current flow includes current flowing through the skin due to parasitic capacitance formed between the skin and a ground or between at least one of the skin contacting electrodes and a shield surrounding at least one of the skin contacting electrodes.

10. The RF skin treatment apparatus of claim 1, wherein the isolating transformer is configured to isolate RF energy supply from a subject undergoing treatment.

11. The RF skin treatment apparatus of claim 1, wherein the isolating transformer is configured to reduce pain sensation during treatment.

12. The RF skin treatment apparatus of claim 1, wherein the isolating transformer is located in dose proximity to the tip.

13. The RF skin treatment apparatus of claim 1, wherein the tip is removable from the applicator.

14. The RF skin treatment apparatus of claim 1, wherein the RF voltage source is located in a stand-alone housing.

15. The RF skin treatment apparatus of claim 1, wherein the harness is greater than about one meter in length.

16. The RF skin treatment apparatus of claim 1, wherein the undesired current flow is current flow due to parasitic capacitance that would occur in an absence of the isolating transformer.

17. An RF skin treatment method, comprising:

applying, from an applicator, an RF pulse to a stratum corneum layer of skin through a tip having a plurality of skin-contacting electrodes associated therewith;

delivering, from an RF voltage source separated from the applicator by a harness, RF energy to the applicator through the harness; and

reducing undesired current flow to the skin by isolating current applied to the stratum corneaum using an isolating transformer electrically disposed between the RF voltage source and the tip, wherein the isolating transformer is located in the applicator, and both ends of a secondary coil of the isolating transformer are configured to connect to the tip.

18. The RF skin treatment method of claim 17, wherein the plurality of skin-contacting electrodes are arranged asymmetrically on the tip.

19. The RF skin treatment method of claim 18, wherein the plurality of skin-contacting electrodes includes at least one electrode having a size greater than a size of other electrodes.

20. The RF skin treatment method of claim 18, wherein the undesired current flow includes current caused by parasitic capacitance between a skin surface and a ground or between at least one of the skin contacting electrodes and a shield surrounding at least one of the skin contacting electrodes.

21. The RF skin treatment method of claim 17, further including controlling energy applied to the stratum corneum in order to cause RF-based fractional skin treatment.

22. The RF skin treatment method of claim 21, wherein the RF-based fractional skin treatment produces a pattern of micron size holes.

23. The RF skin treatment method of claim 17, wherein the isolating transformer is configured to reduce ground currents due to parasitic capacitance.

24. The RF skin treatment method of claim 17, further comprising high pass filtering using at least one capacitor located at an end of the secondary coil and configured for electrical connection to at least some of the plurality of the skin-contacting electrodes.

25. The RF skin treatment method of claim 24, wherein during high pass filtering, low frequency currents generated by plasma formed at the skin-contacting electrodes are filtered.

26. The RE skin treatment method of claim 17, wherein reducing current flow includes isolating current to an extent that a pain sensation is reduced during treatment.

27. An RF skin treatment apparatus, comprising:

an RF voltage source configured to apply an RF pulse to a stratum corneum layer of skin through a tip of an applicator having a plurality of skin-contacting electrodes; and

an isolating transformer configured to be electrically disposed between the RF voltage source and the tip, the isolating transformer being located in the applicator so as to be proximate the tip in order to reduce undesired current flow to the skin, wherein both ends of a secondary coil of the isolating transformer are configured to connect to the tip.